Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

“…24,31 There are however numerous examples of synchrotron based ex situ XRD studies on ALD grown layers. 30,[62][63][64][65][66] This indicates that synchrotron based XRD has several advantages to lab based XRD. The main advantage is the lower detection limit.…”

Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

“…Nevertheless, noble metal electrodes (Ru, RuO 2 ) are of significant importance [16,17] despite the related increase in processing costs. Notable amount of studies on Ru so far have been devoted to the issues related to the nucleation of ruthenium thin films as well as to the parametrization of growth processdependence of the growth rate and roughness on growth temperature, pressure and time [2,[18][19][20][21]. The scope of the research clearly indicates the importance of the deposition process in terms of the optimization of Ru thickness and smoothness as well as the issues related to the adhesion and blistering of Ru layers [15,22], unsolved to date.…”

“…To mention a few, (2,4-dimethylpentadienyl) (ethylcyclopentadienyl)ruthenium [24], bis (2,4-dimethylpentadienyl) ruthenium [25], triruthenium dodecacarbonyl [9] and bis(2,2,6, 6-tetramethyl-heptane-3,5-dionato)(1,5-cyclooctadiene)ruthenium [26], have been applied as Ru precursors in CVD process. Bis(cyclopentadienyl)ruthenium [18][19][20], bis(ethylcyclopentadienyl)ruthenium [19,27], N,N-dimethyl-1-ruthenocene [28], 2,4-(dimethylpentadienyl) (ethylcyclopentadienyl) ruthenium, i.e. DER [29], (methylcyclopentadienyl)(pyrrolyl)ruthenium [15] or isopropylmethylbenzene-cyclohexadiene-ruthenium [2] have been adapted to ALD processes.…”

“…DER [29], (methylcyclopentadienyl)(pyrrolyl)ruthenium [15] or isopropylmethylbenzene-cyclohexadiene-ruthenium [2] have been adapted to ALD processes. Ru films can be grown via reduction of the precursor in hydrogen-assisted thermal process [21] or by using NH 3 plasma [19,27], but mostly the films have been grown via oxidative decomposition of the metal precursor in a continuous or pulsed oxygen flow [18,20,21,24,25].…”

Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique

“…Therefore, many kinds of analytical equipment are used in order to monitor the amount of impurities and maintain the quality of devices. For example, X-ray photoelectron spectroscopy (XPS) [1], secondary ionization mass spectroscopy (SIMS) [2], and electron probe micro analysis (EPMA) [3] are very useful for detecting trace amounts of inorganic impurities. However, detection and identification of the organic impurities on a silicon wafer are still difficult.…”