2015
DOI: 10.1007/s11237-015-9412-z
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Effect of the Formation of Silicon Oxide on the Sign, Magnitude and Formation of Surface Charge Upon Water Adsorption on a Silicon Surface

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Cited by 3 publications
(2 citation statements)
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“…The analysis of the features of the manifestation of the field effect on TAE in a semiconductor made it possible to develop a method for monitoring the charge state on a surface; a detailed description of the methodology can be found in [19][20][21]. In other words, the change in the surface charge leads, through the field effect, to a change in the resistivity of the near-surface region of the space charge of semiconductor, and, accordingly, to the magnitude of TAE.…”
Section: Objects Of Research and Experimental Methodsmentioning
confidence: 99%
“…The analysis of the features of the manifestation of the field effect on TAE in a semiconductor made it possible to develop a method for monitoring the charge state on a surface; a detailed description of the methodology can be found in [19][20][21]. In other words, the change in the surface charge leads, through the field effect, to a change in the resistivity of the near-surface region of the space charge of semiconductor, and, accordingly, to the magnitude of TAE.…”
Section: Objects Of Research and Experimental Methodsmentioning
confidence: 99%
“…The TAE value (the acoustoelectric electromotive force value) is determined by the combination of the surface charges of a biographical origin (forming the initial surface bending of the semiconductor energy bands) and adsorption complexes. [77][78][79][80][81] To measure the TAE, a surface acoustic wave was excited in the z-direction of the yz-LiNbO 3 piezoelectric substrate using an interdigital transducer at a frequency of 37 MHz, a duration of 1.5 ms, and an aperture of 1.8 mm (ESI, † Fig. S2).…”
Section: Structure Analysismentioning
confidence: 99%