Effects of applied potential and solution temperature T. on the pitting corrosion of pure aluminium (AI) were investigated in 0.01 M NaCI solutions containing various sulphate (SO, 2-) ion concentrations using a potentiodynamic polarisation experiment, the potentiostatic current transient technique, ac impedance spectroscopy and atomic force microscopy (AFM). The potentiodynamic polarisation curves showed a rise in the pitting potential E,, values and a simultaneous increase in anodic current density at potentials much higher than the Ep,, value as the SO42-ion concentration increases. This implies that SO,"-ions impede pit initiation at potentials below Ep, but enhance pit growth above Ep,,. This was confirmed from the larger pit growth rate parameter b values of pure A1 exposed to SO4 ~ ion-containing chloride solutions during the abrading action than those exposed to SO42-ion-free chloride solution. Furthermore, at E=25~ the charge density Q values for the A1 metal dissolution in the presence of SO42-ions were smaller than the value in its absence. By contrast, as validated by the capacitance values and the AFM images of the re-anodized specimens, an enhanced metal dissolution was observed in SO42-ion-containing chloride solutions at T,=60 ~ and 80~ From the experimental findings, it is suggested that SO42-ions act as inhibitors of pitting corrosion on pure AI below E~,, and at T,=25~ whereas they act as promoters at T,=60 ~ and 80~ This originates from the accelerated dissolution of the bare metal extensively exposed to the temperature-sensitive C1-ion attack, which occurs at potentials above E,,,,.