2011
DOI: 10.1016/j.apsusc.2011.03.156
|View full text |Cite
|
Sign up to set email alerts
|

Effect of substrate temperature and oxygen partial pressure on microstructure and optical properties of pulsed laser deposited yttrium oxide thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
5
0

Year Published

2012
2012
2024
2024

Publication Types

Select...
9

Relationship

1
8

Authors

Journals

citations
Cited by 30 publications
(5 citation statements)
references
References 39 publications
0
5
0
Order By: Relevance
“…The details of the target sintering methods, their characterizations and substrate cleaning methods were already reported in previous publications [22,23]. A KrF excimer laser (Lambda Physik Compex-205, 248 nm wavelength) was used as the energy source to evaporate the targets for multilayer deposition.…”
Section: Methodsmentioning
confidence: 99%
“…The details of the target sintering methods, their characterizations and substrate cleaning methods were already reported in previous publications [22,23]. A KrF excimer laser (Lambda Physik Compex-205, 248 nm wavelength) was used as the energy source to evaporate the targets for multilayer deposition.…”
Section: Methodsmentioning
confidence: 99%
“…Y-TZP powder exhibits a low absorption from the UV to the infrared regions. Yttria is known to have a low-absorption in the range 240 nm to 12 µm [31], [32]. The refractive index of the Y-TZP stabilized with 3 mol% Y2O3 and the Ce-TZP doped with 12 mol% of CeO2 has not been determined.…”
Section: Optical Propertiesmentioning
confidence: 99%
“…The optical bandgap of the samples can be estimated using Tauc's relation [26] using the following Equation ( 1…”
Section: Characterization Of Photocatalystsmentioning
confidence: 99%