Effect of Pre-treatment and Duration of Pulse Plasma Nitriding on Duplex Plasma Treatment by Physical Vapor Deposition of TiN on AISI D2 Steel

Das, Kalyan; Joseph, Alphonsa; Ghosh, Abhishek; Saha, G.; Rane, R.; Mukherjee, S.; Ghosh, Manojit

doi:10.1007/s11665-022-07776-3

Cited by 3 publications

(1 citation statement)

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“…With the demand to increase the service life of Al alloy parts, it is necessary to improve the surface mechanical properties of aluminum alloys [5]- [7]. The way to reduce this deficiency is through the use of a hard protective layer, usually made using Chemical Vapor Deposition (CVD) or Physical Vapor Deposition (PVD) [8]- [10]. One of the PVD coating methods that can be used for the development of this aluminum alloy is DC sputtering [11]- [13].…”

Section: Introductionmentioning

confidence: 99%

Hardness and Microstructure of TiN Coating on Aluminum Alloy with DC Sputtering

Margono,

Darmadi,

Widodo

et al. 2024

MSF

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Titanium Nitride coating has attracted much interest in increasing the hardness of aluminum alloys. This study aims to investigate the effect of Ar: N gas mixture and time on increasing the hardness of aluminum alloys using DC sputtering. Preparation of TiN thin films on aluminum alloy substrates using flowing gas mixture parameters and time. First, the layer of TiN was deposited on the sample with a gas mixture of 90Ar:10N; 80Ar:20N; 70Ar:30N; and 60Ar:40N (%) for 60 minutes. Then the optimum gas mixture that produces the highest surface hardness is used in the second process with time variations of 30, 60, 90, and 120 minutes. The results showed that the highest hardness was achieved in a gas mixture of 70Ar:30N and 60 minutes. The TiN phase formed on the aluminum surface was identified by XRD, while the surface morphology was observed by SEM. Compared with untreated samples, the hardness of treated samples increased significantly.

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