Effect of Nitrogen Ion Implantation in Copper

Sari, A. H.; Salem, M. K.; Shoorche, A.

doi:10.1007/s10894-011-9381-8

Cited by 6 publications

(2 citation statements)

References 19 publications

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“…1 a and b , direct nitrogen ion implantation could lead to the formation of these phases. The reaction energy for the formation of copper azides is likely provided by ion implantation to overcome the undesired thermodynamic factor [22].…”

Section: Resultsmentioning

confidence: 99%

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted‐annealed copper

Kazemeini-Asl¹,

Larijani

Fathollahi³

2014

Micro & Nano Letters

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Cu thin films sputter-coated on single crystals of silicon were implanted with 30 keV nitrogen ions under various doses from 1.9 × 10 17 to 5.7 × 10 17 ions/cm 2. The prepared samples were subsequently annealed in nitrogen atmosphere. The grazing incidence X-ray diffraction analysis revealed that in addition to the crystalline copper nitride phase, copper azides were developed by nitrogen ion implantation. With an increase of the implantation dose to 2.3 × 10 18 ions/cm 2 , much of the Cu film was transformed to the crystalline Cu 3 N phase. Furthermore, the effect of nitrogen ion implantation on Cu thin films under various doses was investigated. The structural properties, morphology and sheet resistance of samples were investigated by grazing incidence X-ray diffraction, atomic force microscopy, field emission scanning electron microscopy and four-point probe techniques, respectively. In addition, the dependence of resistivity of the implanted samples on the implantation dose as well as structural properties is discussed.

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Section: Resultsmentioning

confidence: 99%

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted‐annealed copper

Kazemeini-Asl¹,

Larijani

Fathollahi³

2014

Micro & Nano Letters

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“…The strut dowel should survive very harsh environment, such as extremely low temperature, huge stresses (forces) and neutron irradiation. The electromagnetic forces owing to plasma discharge may not only increase the load, but also lead to the movement of the strut dowel [4] . Therefore, the surface of strut dowel needs to possess satisfactory tribological property.…”

Section: Introductionmentioning

confidence: 99%

Ion-Beam Surface Modification of Strut Dowel Used in ITER PF Support

Luo¹,

Peng-yuan²,

Han³

et al. 2013

Plasma Sci. Technol.

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In this paper, surface modification of the strut dowel used in ITER PF support is reported. Different ions (nitrogen/titanium) with different doses are implanted into the surface of strut dowel. The result of Auger Electron Spectroscopy (AES) indicates that nitrogen can be implanted more deeply than titanium under the implantation condition of 60 kV accelerating voltage and a dose of 8×10 17 /cm 2 nitrogen. Surface Micro Hardness (SMH) and wear resistance are improved remarkably. Further SEM observation shows that there are no obvious scratches and damages after wear test.

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Investigation of the Influence of Crystallization Energy on the Size of Nanostructures During Copper Ion-Plasma Treatment

Shyrokyi

Kostyuk

2022

Integrated Computer Technologies in Mechanical Engineering - 2021

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Effect of Nitrogen Ion Implantation in Copper

Cited by 6 publications

References 19 publications

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted‐annealed copper

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted‐annealed copper

Ion-Beam Surface Modification of Strut Dowel Used in ITER PF Support

Investigation of the Influence of Crystallization Energy on the Size of Nanostructures During Copper Ion-Plasma Treatment

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