Effect of KrF Laser Irradiation on the Morphology and Microstructure of Amorphous PZT Thin Films Grown by RF Magnetron Sputtering

Mahdi, M.; Kadri, M.

doi:10.1007/s11664-021-08980-y

Cited by 3 publications

(6 citation statements)

References 26 publications

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“…When irradiating the material, laser energy is absorbed and the surface layer of the material is heated to a high temperature at a large heating rate, which are always accompanied by the origination of high stress and stress gradient. The high temperature together with the stress drive the material to evolve, like crystallinity improvement, [12][13][14] texture evolution, [15] voids elimination, [16] and recrystallization. [17] In the present study, according to the material analysis (Figure 2 and 3), the metastable as-deposited gold film recrystallized after laser irradiation.…”

Section: Effect Of Pulsed Laser Irradiation On the Microstructure Of ...mentioning

confidence: 99%

“…[6,8] And this may bring about some detrimental changes, e.g., weakening the bonding between gold film and the substrate, and leading to grain boundary cracks. [8] Laser irradiation is a versatile mean in the machining and processing of materials [9][10][11] and was applied to regulate both the microstructure [12][13][14][15][16][17] and stress [17][18][19][20] of films and coatings. Goud [12] studied the laser irradiation of Ba 0.5 Sr 0.5 TiO 3 thin films, and the results showed that laser irradiation can turn the film deposited at low temperature from amorphous to crystalline.…”

Section: Introductionmentioning

confidence: 99%

“…Laser irradiation is a versatile mean in the machining and processing of materials [ 9–11 ] and was applied to regulate both the microstructure [ 12–17 ] and stress [ 17–20 ] of films and coatings. Goud [ 12 ] studied the laser irradiation of Ba 0.5 Sr 0.5 TiO 3 thin films, and the results showed that laser irradiation can turn the film deposited at low temperature from amorphous to crystalline.…”

Section: Introductionmentioning

confidence: 99%

“…Liu [ 13 ] studied the laser irradiation of CVD diamond coatings, and the results showed that the crystallinity improved significantly after laser irradiation. Mahdi [ 14 ] studied laser irradiation of amorphous PZT thin films, and results showed that crystallization of the amorphous films can be induced under laser irradiation. Hsieh [ 15 ] studied the pulsed laser annealing of evaporated Cu films, and the results showed that the (111) texture increased with the laser energy for energy density below 1.0 J cm −2 .…”

Section: Introductionmentioning

confidence: 99%

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Effect of Pulsed Laser Irradiation on Microstructure and Evolution of Residual Stress for Gold Film

Zhou

Shao

et al. 2022

Adv Eng Mater

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Gold film is extensively used in a variety of electronic, optical, and magnetic instruments or devices. Effect of pulsed laser irradiation on microstructure and evolution of residual stress for gold film is studied. Gold film deposited on a silica substrate is irradiated by pulsed laser with different energy densities. Microstructures of the gold film before and after laser irradiation are studied by using scanning electron microscope, scanning transmission electron microscope, and energy‐dispersive X‐ray spectrometry. Recrystallization occurs during laser irradiation. Most of the original defects in the as‐deposited gold film are eliminated, and the films become smooth and more compact after laser irradiation. Curvature‐based technique using Stoney formula is applied to evaluate the residual stress. Pulsed laser irradiation results in the increase in tensile residual stress and stability of the residual stress.

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Section: Effect Of Pulsed Laser Irradiation On the Microstructure Of ...mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Effect of Pulsed Laser Irradiation on Microstructure and Evolution of Residual Stress for Gold Film

Zhou

Shao

et al. 2022

Adv Eng Mater

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“…Simultaneously, annealing treatments of the channel layer have the potential to enhance transistor transport characteristics and stability, further affecting the on/off ratio performance. Consequently, the precise control and optimization of ferroelectric thin-film growth parameters, alongside the exact implementation of channel layer annealing, offer promising avenues for further enhancing FeFET’s performance. ,− …”

Section: Introductionmentioning

confidence: 99%

Ferroelectric Controlled Interfacial Effect on the Electronic Properties of PZT Gated IGZO Channel Thin-Film Transistors

Teng,

Bao,

et al. 2024

ACS Appl. Electron. Mater.

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The performance of nonvolatile memory has to be further enhanced in order to keep up with the quick growth of electronic devices. The present study focuses on optimizing the fabrication of Pb(Zr 0.52 Ti 0.48 )O 3 (PZT) epitaxial thin films and the impacts of oxygen-rich annealing on their crystal structures and ferroelectric properties. The transistor characteristics of ferroelectric PZT gated indium−galliumzinc-oxide (IGZO)-channel thin-film transistors (i.e., PZT/IGZO transistors) are also studied. We have demonstrated that postannealing treatment significantly enhances the ferroelectric properties of PZT thin films, achieving a residual polarization of 45.4 μC/cm 2 and a saturation polarization of 74.2 μC/cm 2 . Highquality PZT film is beneficial for regulating the transport properties of IGZO channel transistors. Simultaneously, the on/off ratio of the transistors is significantly enhanced through an additional annealing process in an oxygen atmosphere, approaching a magnitude of 10 7 . A polarization-controlled trapping and detrapping mechanism is tentatively proposed to explain the clockwise hysteresis observed in the transfer characteristics of the PZT/IGZO transistors.

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Piezoelectric Micromachined Ultrasound Transducer Technology: Recent Advances and Applications

Wan

Jiang

et al. 2022

Biosensors

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The objective of this article is to review the recent advancement in piezoelectric micromachined ultrasound transducer (PMUT) technology and the associated piezoelectric materials, device fabrication and characterization, as well as applications. PMUT has been an active research topic since the late 1990s because of the ultrasound application needs of low cost large 2D arrays, and the promising progresses on piezoelectric thin films, semiconductors, and micro/nano-electromechanical system technology. However, the industrial and medical applications of PMUTs have not been very significant until the recent success of PMUT based fingerprint sensing, which inspired growing interests in PMUT research and development. In this paper, recent advances of piezoelectric materials for PMUTs are reviewed first by analyzing the material properties and their suitability for PMUTs. PMUT structures and the associated micromachining processes are next reviewed with a focus on the complementary metal oxide semiconductor compatibility. PMUT prototypes and their applications over the last decade are then summarized to show the development trend of PMUTs. Finally, the prospective future of PMUTs is discussed as well as the challenges on piezoelectric materials, micro/nanofabrication and device integration.

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Effect of KrF Laser Irradiation on the Morphology and Microstructure of Amorphous PZT Thin Films Grown by RF Magnetron Sputtering

Cited by 3 publications

References 26 publications

Effect of Pulsed Laser Irradiation on Microstructure and Evolution of Residual Stress for Gold Film

Effect of Pulsed Laser Irradiation on Microstructure and Evolution of Residual Stress for Gold Film

Ferroelectric Controlled Interfacial Effect on the Electronic Properties of PZT Gated IGZO Channel Thin-Film Transistors

Piezoelectric Micromachined Ultrasound Transducer Technology: Recent Advances and Applications

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