Effect of deposition temperature of SiN/sub x//a-Si/n/sup +/a-Si films by monochamber PECVD processing on a-Si TFT electrical characteristics and stability

Lin, Hui Chu; Chen, Yeong-E

doi:10.1109/asid.1999.762724

Proceedings of 5th Asian Symposium on Information Display. ASID '99 (IEEE Cat. No.99EX291)

DOI: 10.1109/asid.1999.762724

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Effect of deposition temperature of SiN/sub x//a-Si/n/sup +/a-Si films by monochamber PECVD processing on a-Si TFT electrical characteristics and stability

Hui Chu Lin

Yeong-E Chen

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Effect of deposition temperature of SiN/sub x//a-Si/n/sup +/a-Si films by monochamber PECVD processing on a-Si TFT electrical characteristics and stability

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