Effect of adsorbed water on mechanical and mechanochemical properties of silicate glasses

He, Hongtu; Yu, Jiaxin

doi:10.1016/j.nocx.2023.100189

Cited by 2 publications

(5 citation statements)

References 136 publications

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“…fused silica or silicon substrates. The seed layer thickness is chosen to be 25 nm to avoid substrate-based oxidization through the diffusion of oxygen in fused silica. , In most cases, the TiN thickness was 50 nm, and that of the Cr 90 Ru 10 seed was 25 nm, except for films intended for ATR studies where the thicknesses were necessarily reduced. Process parameters were deposition rates, controlled by magnetron power, the partial pressures of Ar and N 2 mediated through mass flow rates, and substrate temperature.…”

Section: Experimental Methodsmentioning

confidence: 99%

“…Although Dong et al have shown that the use of CrRu as an intermediate layer initiates the textured growth of TiN; however, the extensive optical properties of deposited TiN thin films using CrRu as a buffer/seed layer have not been studied so far. Beneficially CrRu does not introduce additional contamination through oxidation at higher temperature deposition. , …”

Section: Introductionmentioning

confidence: 99%

“…Beneficially CrRu does not introduce additional contamination through oxidation at higher temperature deposition. 40,41 In this article, we have addressed the novel use of a chromium ruthenium (Cr 90 Ru 10 ) alloy buffer layer to attain best-in-class FOM at wafer deposition temperatures ∼300 °C and demonstrated the plasmonic functionality in patterned nanoentities. The crystalline characteristics and thickness of the films were investigated by X-ray diffraction (XRD) and reflection techniques.…”

Section: ■ Introductionmentioning

confidence: 99%

“…Beneficially CrRu does not introduce additional contamination through oxidation at higher temperature deposition. 40 , 41 …”

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Synthesis of Plasmonically Active Titanium Nitride Using a Metallic Alloy Buffer Layer Strategy

Lipinski,

Lambert,

Maity

et al. 2023

ACS Appl. Electron. Mater.

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Titanium nitride (TiN) has emerged as a highly promising alternative to traditional plasmonic materials. This study focuses on the inclusion of a Cr 90 Ru 10 buffer layer between the substrate and thin TiN film, which enables the use of cost-effective, amorphous technical substrates while preserving high film quality. We report best-in-class TiN thin films fabricated on fused silica wafers, achieving a maximum plasmonic figure of merit, −ϵ′/ϵ″, of approximately 2.8, even at a modest wafer temperature of around 300 °C. Furthermore, we delve into the characterization of TiN thin film quality and fabricated TiN triangular nanostructures, employing attenuated total reflectance and cathodoluminescence techniques to highlight their potential applications in surface plasmonics.

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Section: Experimental Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: ■ Introductionmentioning

confidence: 99%

“…Beneficially CrRu does not introduce additional contamination through oxidation at higher temperature deposition. 40 , 41 …”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Synthesis of Plasmonically Active Titanium Nitride Using a Metallic Alloy Buffer Layer Strategy

Lipinski,

Lambert,

Maity

et al. 2023

ACS Appl. Electron. Mater.

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show abstract

“…30 Different strengthening mechanisms for SLS in hydrothermal conditions have been proposed. 33 On one hand, it seems that the hydrated layer decreases the hardness [34][35][36][37][38] , thus, decreasing the surface stress responsible for the crack formation. 25 The strengthening is therefore supposed to be related to the partial depolymerization of the glass network through the formation of terminal Si-OH units.…”

Section: Introductionmentioning

confidence: 99%

On the structure and properties of hydrothermally toughened soda–lime silicate float glass

Sorarù,

Mariazzi,

Barozzi

et al. 2024

J Am Ceram Soc.

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Hydrothermal treatments of soda–lime silicate glass cause a remarkable improvement in the resistance to flaw formation with an increase of the critical load to ≈1 kgf. This remarkable effect is achieved even if the reaction layer between the glass and water solution is well below 1 µm. Positron Doppler broadening spectroscopy (DBS) reveals that the hydrothermal treatment causes a drop in the free volume of the glass network near the surface connected with the diffusion of molecular water whose presence was further confirmed by Fourier transformed infrared (FTIR) spectroscopy and secondary ion mass spectrometry (SIMS). Based on FTIR and SIMS, we also argue that the hydrothermal ion exchange is a double‐step process: first H+ substitutes Na+ in the network, and following molecular water permeates the system. Moreover, we show that the presence of water in the network is fundamental in stabilizing the modified glass surface leading to toughening. Once molecular water is released, the network is quickly polymerized and becomes more brittle. Hydrothermal toughening is only a partially reversible process, once water is released it is not possible to reobtain the same properties with a second treatment. Finally, it is shown that air and tin side of the float glass perform differently as a result of different water diffusion kinetics related to dissimilarities in the network density.

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Effect of adsorbed water on mechanical and mechanochemical properties of silicate glasses

Cited by 2 publications

References 136 publications

Synthesis of Plasmonically Active Titanium Nitride Using a Metallic Alloy Buffer Layer Strategy

Synthesis of Plasmonically Active Titanium Nitride Using a Metallic Alloy Buffer Layer Strategy

On the structure and properties of hydrothermally toughened soda–lime silicate float glass

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