2022
DOI: 10.1063/5.0090498
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Dynamic evolution process from bipolar to complementary resistive switching in non-inert electrode RRAM

Abstract: At present, the physical mechanism of complementary resistive switching (CRS) devices remains controversial. In this Letter, stable CRS can be achieved in Pt/AlOxNy/Ta resistive random access memory (RRAM). A dynamic evolution from bipolar resistive switching to CRS can be evidently observed in non-inert electrodes RRAM. The causes of CRS behavior are analyzed in detail, and these phenomena are attributed to the different oxidation degrees of the top electrode and propose that the transition state can be used … Show more

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Cited by 6 publications
(4 citation statements)
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“…In contrast, the I-V curve in the low voltage region ('1' state), shown in figure 4(d) replotted in a double logarithm scale, shows a linear change with a slope of 1.10, which corresponds to Ohmic conduction mechanism (I ∝ V 1 ) [16]. This suggests that conducive channels The dominated Schottky emission mechanism, based on curve fitting, implies the formation of a barrier at the TE/Albumen interface [19]. Considering the non-inert Al electrode has a strong tendency to be electrically oxidized by the pre-existing oxygen element in Albumen film [32], depth-profiling XPS analysis was performed to determine the chemical bonding states of Al TE layer after the I-V curves measurement.…”
Section: The Crs Mechanism Discussionmentioning
confidence: 94%
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“…In contrast, the I-V curve in the low voltage region ('1' state), shown in figure 4(d) replotted in a double logarithm scale, shows a linear change with a slope of 1.10, which corresponds to Ohmic conduction mechanism (I ∝ V 1 ) [16]. This suggests that conducive channels The dominated Schottky emission mechanism, based on curve fitting, implies the formation of a barrier at the TE/Albumen interface [19]. Considering the non-inert Al electrode has a strong tendency to be electrically oxidized by the pre-existing oxygen element in Albumen film [32], depth-profiling XPS analysis was performed to determine the chemical bonding states of Al TE layer after the I-V curves measurement.…”
Section: The Crs Mechanism Discussionmentioning
confidence: 94%
“…To clarify the conduction mechanisms, it is a common practice to analyze the conduction behaviors at LRS and HRS by fitting the I-V characteristics [16,19]. The I-V curve at the '0' state is replotted in double logarithmic scale and linearly fitted in the low positive voltage region, as shown in figure 4(a).…”
Section: The Crs Mechanism Discussionmentioning
confidence: 99%
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“…The dynamic evolutionary process from BRS to CRS reveals that the CC value during the forming process and the oxidation degree of the non-inert electrode are the key factors controlling CRS behavior. 46 They proposed that applying a substantial positive bias leads to the formation of a barrier between CFs and the semiconductor-like TaO x layer. Conversely, employing a significant negative bias gives rise to another barrier between the metal-like Ta layer and the AlO x N y layer.…”
Section: Introductionmentioning
confidence: 99%