2011
DOI: 10.1016/j.nima.2010.04.081
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Development of SOI pixel process technology

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Cited by 158 publications
(77 citation statements)
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“…The same detection method employing LEKID resonators was conducted by Moore et al [5], who obtained the energy resolution of 550 eV at 30 keV after the position correction with the resolution of ≤ 1 mm. The higher position resolution may improve the energy resolution and be achieved using a SOI pixel sensor able to function at low temperature less than 1 K. We propose the combination of SOI pixel sensor [10] and LEKID. The SOI pixel detector senses the ionization signal and identifies the position with a 0.1 mm precision, while LEKID formed in the backside of the substrate detects athermal phonons to measure the total energy.…”
Section: Possible Applicationsmentioning
confidence: 99%
“…The same detection method employing LEKID resonators was conducted by Moore et al [5], who obtained the energy resolution of 550 eV at 30 keV after the position correction with the resolution of ≤ 1 mm. The higher position resolution may improve the energy resolution and be achieved using a SOI pixel sensor able to function at low temperature less than 1 K. We propose the combination of SOI pixel sensor [10] and LEKID. The SOI pixel detector senses the ionization signal and identifies the position with a 0.1 mm precision, while LEKID formed in the backside of the substrate detects athermal phonons to measure the total energy.…”
Section: Possible Applicationsmentioning
confidence: 99%
“…One impressive development [22] demonstrated good performance in a particle beam [23]. Further work is planned to improve the radiation tolerance, lower due to accumulation of radiation induced charge in the buried oxide.…”
Section: Silicon On Insulator or Soimentioning
confidence: 99%
“…Therefore, the potential of silicon substrate affects the threshold voltage and leakage current of the transistors [15]. Buried P-Well (BPW) technology has been proposed by KEK [16,17] to suppress the back-gate effect. In addition, BPW has an impact on the pixel characteristics because it affects the carrier collection process.…”
Section: Introductionmentioning
confidence: 99%