2005
DOI: 10.1016/j.tsf.2004.08.124
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Development of organic thin film transistors based on flexible substrates

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Cited by 10 publications
(7 citation statements)
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“…More recently, the compatibility of anodized Al 2 O 3 as well as a number of polymeric dielectric films with a variety of polymeric substrates has been investigated for the fabrication of polymeric and molecularbased OFETs. [28] Knipp et al reported on a comparison of the properties of SiO x and SiN x fabricated via plasma-enhanced chemical vapor deposition (PECVD) as gate dielectrics, and characterization of the resulting pentacene-based TFTs. [29] This deposition technique was selected since it enables large-area fabrication and low-cost electronics on glass or flexible plastic substrates.…”
Section: ±2mentioning
confidence: 99%
“…More recently, the compatibility of anodized Al 2 O 3 as well as a number of polymeric dielectric films with a variety of polymeric substrates has been investigated for the fabrication of polymeric and molecularbased OFETs. [28] Knipp et al reported on a comparison of the properties of SiO x and SiN x fabricated via plasma-enhanced chemical vapor deposition (PECVD) as gate dielectrics, and characterization of the resulting pentacene-based TFTs. [29] This deposition technique was selected since it enables large-area fabrication and low-cost electronics on glass or flexible plastic substrates.…”
Section: ±2mentioning
confidence: 99%
“…Organic semiconductors offer the possibility to fabricate devices featuring biocompatibility, 1,2 mechanical flexibility, [3][4][5] and comparably low production costs. 1,2 Therefore, a wide range of applications employing organic semiconductors is being currently explored in the fields of biosensing and biomedical technologies.…”
mentioning
confidence: 99%
“…The C o of the ZA, AZ, and AZA samples is 200, 146, and 196 nF/cm 2 , respectively, which is much larger than that of their Al 2 O 3 counterpart. [26][27][28] As compared to the ZA and AZA sample, the AZ sample exhibits a smaller C o . This may be attributed to the formation of a lowk interlayer facilitated by oxygen gas during ZrO 2 sputtering.…”
Section: Resultsmentioning
confidence: 97%