2010
DOI: 10.1021/la1035147
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Development of a Colloidal Lithography Method for Patterning Nonplanar Surfaces

Abstract: A colloidal lithography method has been developed for patterning nonplanar surfaces. Hexagonal noncontiguously packed (HNCP) colloidal particles 127 nm-2.7 μm in diameter were first formed at the air-water interface and then adsorbed onto a substrate coated with a layer of polymer adhesive ∼17 nm thick. The adhesive layer plays the critical role of securing the order of the particles against the destructive lateral capillary force generated by a thin film of water after the initial transfer of the particles fr… Show more

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Cited by 43 publications
(39 citation statements)
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(45 reference statements)
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“…In addition, colloid lithography has been applied to generate nanoscale topographical features on curvilinear surfaces of microscale particles and scaffolds to create hierarchical topographical biomaterials that are difficult to obtain using conventional methods [3941, 56]. Combining nanoscale patterned surfaces generated by photolithography and EBL with colloid self-assembly, it is also possible to achieve regular patterns of nanotopography with curvilinear local geometries [59].…”
Section: Fabrication Of Nanotopographical Surfacesmentioning
confidence: 99%
“…In addition, colloid lithography has been applied to generate nanoscale topographical features on curvilinear surfaces of microscale particles and scaffolds to create hierarchical topographical biomaterials that are difficult to obtain using conventional methods [3941, 56]. Combining nanoscale patterned surfaces generated by photolithography and EBL with colloid self-assembly, it is also possible to achieve regular patterns of nanotopography with curvilinear local geometries [59].…”
Section: Fabrication Of Nanotopographical Surfacesmentioning
confidence: 99%
“…[74] Similarly, assembly at the air/water interface has been exploited for the preparation of non-close-packed monolayers. [203][204] An alternative approach consists of the preparation of close-packed monolayers that are exposed to plasma in order to yield non-close-packed arrangements. [95,136,205] Several researchers have applied this process.…”
Section: Introductionmentioning
confidence: 99%
“…[ 15 ] Colloidal lithography has also been used to pattern diverse substrates with particles as small as ≈ 100 nm. [ 16 ] Here, we present an alternative patterning technique based on initiated chemical vapor deposition (iCVD). Our method is unique in that it yields high-resolution polymeric features on planar and curved substrates, enables fabrication of metal features via pattern transfer, and facilitates synthesis of bifunctional organic surfaces.…”
Section: Doi: 101002/adma201201975mentioning
confidence: 99%