Deterministic Thermal Sculpting of Large‐Scale 2D Semiconductor Nanocircuits

Abstract

acknowledges financial support by Università degli Studi di Genova within the project BIPE 2020. M.C.G. acknowledges financial support by Ministero degli Affari Esteri e della Cooperazione Internazionale (MAECI) within "Progetti di Grande Rilevanza 2021-2023" -bilateral project Italy-Vietnam "Large-area 2D/plasmonic heterostructures for photocatalysis and energy storage (H2D)". G.Z. acknowledges support from Compagnia di San Paolo for financing his Ph.D. scholarship.

Large area van der Waals MoS2–WS2 heterostructures for visible-light energy conversion

“…Large area growth techniques are actively investigated, ranging from printable nanosheet inks in view of flexible and wearable electronics to chemical vapor deposition, [37][38][39] and a continuous effort is put in the search for wafer-scale homogeneous growth techniques with thickness control, enabling the application of 2D materials in circuit integration. [40][41][42] At the same time, development of large area transparent electrodes, such as those based on graphene, is crucial for the growth of van der Waals heterostructures and for the fabrication and interconnection of TMD-based devices. [43][44][45] In this work, we develop large area physical deposition of 2D TMD films based on ion beam sputtering and recrystallization in a sulfur enriched atmosphere.…”

Flat-optics hybrid MoS2/polymer films for photochemical conversion

“…Two-dimensional (2D) Transition Metal Dichalcogenides semiconductor (TMDs) layers have recently collected a growing interest due to their exceptional optoelectronic properties [1][2][3][4] that make them a very promising platform for new generation devices in photonics [5][6][7][8][9][10][11] , energy storage 12,13 and quantum technologies 14,15 . In particular, 2D-MoS 2 semiconductor layers have attracted attention due to their intriguing optoelectronic response that is characterized by excitonic modes in the Visible spectral range, and by the indirect to direct bandgap transition when the thickness decreases from the few-to the single-layer regime [16][17][18][19] . In parallel, this material is endowed with an enhanced photon absorption coefficient with respect to conventional bulk inorganic semiconductors 20 .…”

“…14,15 In particular, 2D-MoS 2 semiconductor layers have attracted attention due to their intriguing optoelectronic response that is characterized by excitonic modes in the visible spectral range, and by the indirect to direct bandgap transition when the thickness decreases from the few-to the single-layer regime. [16][17][18][19] In parallel, this material is endowed with an enhanced photon absorption coefficient with respect to con-ventional bulk inorganic semiconductors. 20 Such an intriguing optical response combined with high chemical reactivity qualifies few-layer MoS 2 as a promising candidate in photo-chemistry and energy storage applications.…”

Thermal Scanning-Probe Lithography for Broad-Band On-Demand Plasmonic Nanostructures on Transparent Substrates

“…Thermal scanning-probe lithography (t-SPL) is a recently developed direct-writing mask-less scanning-probe technique that is progressively gaining more interest thanks to the fact that its nanometric resolution can be exploited both for the deterministic writing of nanopatterns and for the thermal probing of thin films or fragile nanosystems at the nanoscale. − This is possible thanks to the noninvasive thermal probe–sample interaction that ensures the integrity of the sample unlike other techniques of comparable resolution. − Taking advantage of these unique features, t-SPL has been already largely exploited for the nanopatterning of fragile 2D materials. − Since the high-resolution nanolithography is naturally accompanied by the in situ contact mode imaging, the t-SPL technique uniquely enables the real-time imaging of the thermally defined nanostructures. Additionally, the precise alignment of deterministic nanostructures with respect to target features can be achieved thanks to a closed-loop configuration of the system .…”

“… 24 − 29 Taking advantage of these unique features, t-SPL has been already largely exploited for the nanopatterning of fragile 2D materials. 30 − 33 Since the high-resolution nanolithography is naturally accompanied by the in situ contact mode imaging, the t-SPL technique uniquely enables the real-time imaging of the thermally defined nanostructures. Additionally, the precise alignment of deterministic nanostructures with respect to target features can be achieved thanks to a closed-loop configuration of the system.…”