Detailed space-resolved characterization of a laser-plasma soft-x-ray source at 135-nm wavelength with tin and its oxides

Choi, Il Woo; Daido, Hiroyuki; Yamagami, Susumu; Nagai, Keiji; Norimatsu, T.; Takabe, H.; Suzuki, Masayuki; Νακαyama, Takeyoshi; Matsui, Tetsuya

doi:10.1364/josab.17.001616

Cited by 50 publications

(33 citation statements)

References 26 publications

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“…This also coincides with observations of lowdensity Sn-doped foam, SnO 2 , and targets with low Sn concentration. [24][25][26][27] In the case of the dual pulse, laser energy is deposited in the preformed plume with a smooth density profile. The ablation pressure is reduced with a smooth initial density profile, because the laser is absorbed in the lower densities farther from the ablation surface.…”

Section: -6mentioning

confidence: 99%

Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Tao

Tillack

Harilal

et al. 2007

Journal of Applied Physics

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The interaction of a laser pulse with a Sn preplasma formed by a low energy prepulse was investigated for an extreme ultraviolet ͑EUV͒ lithography light source. A much lower ion kinetic energy and nearly the same conversion efficiency from laser to in-band ͑2% bandwidth͒ 13.5 nm EUV light were simultaneously observed as compared with those from the direct interaction with a solid surface. The reason comes from the interaction of the laser pulse with a smooth preplume induced by the prepulse. The density profile of the preplume was measured with time-resolved shadowgraphy and could be fitted with a Gaussian function. The energy of the ions located at the flux peak E p scales with the length of the preplume l s as E p ϰ 1/l s . Laser absorption in the low-density preplume and ion acceleration during plasma expansion are discussed. This result provides a general way to control particle energy from a laser plasma interaction.

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Section: -6mentioning

confidence: 99%

Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Tao

Tillack

Harilal

et al. 2007

Journal of Applied Physics

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“…We focused our numerical investigations on a tin target because of its current interest as a source for λ=13.5 nm EUV lithography [60][61][62]. For the final benchmarking test (see Section 6.4), we considered the influence on the CE of three factors: dependence on a wavelength of laser, target geometry, and laser beam geometry.…”

Section: Resultsmentioning

confidence: 99%

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

Sizyuk¹,

Hassanein²,

Morozov³

et al. 2007

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“…To produce the lithographic light, the extreme ultraviolet (EUV) light source utilizes EUV light from laserproduced plasmas (LPPs), which produces highly efficient 13.5 nm EUV. 6 Recently, power of 100 W at the intermediate focus has been obtained through improvements to the entire EUVL system by the use of liquid tin droplets. 7,8 Yet, for EUVL high volume manufacturing (HVM) to be viable, the power at the intermediate focus must be greater than 240 W. Therefore any improvements that could increase the power and cost-efficiency of the system would be welcome.…”

Section: Introductionmentioning

confidence: 99%

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

Musgrave

Takehiro

Ugomori

et al. 2017

Review of Scientific Instruments

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With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

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Detailed space-resolved characterization of a laser-plasma soft-x-ray source at 135-nm wavelength with tin and its oxides

Cited by 50 publications

References 26 publications

Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

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