Design and development of a novel monolithic compliant XY stage with centimeter travel range and high payload capacity

Abstract

Abstract. This article proposes a novel monolithic compliant spatial parallel XY stage (SPXYS). An important feature of the SPXYS lies in that it can deliver centimeter travel range and sustain large out-of-plane payload while possessing a compact structure, which makes the SPXYS suitable for some special applications such as Ultra-Violet Nanoimprint Lithography and soft-contact lithography. Different from conventional compliant positioning stages, the proposed SPXYS consists of a monolithic spatial parallel linear compliant mechanism (SPLCM) driven by four matching designed voice coil motors (VCMs). The moving platform of the stage is connected to the base by four spatial prismatic-prismatic (PP) joints, which are enveloped from planar PP joint based on the position space reconfiguration (PSR) method to realize desired travel range, payload capacity and compact size. The mechatronic model of the SPXYS is established by integrated using matrix structural analysis (MSA) and the method of images. The design flow chart of the SPXYS is given based on the key parameter sensitivity analysis. Furthermore, a reified SPXYS is designed and manufactured. The analytical design of the stage is confirmed by experiments. The reified stage has a travel range of 20.4 × 20.6 mm 2 , a compact structure with area ratio 1.87 %, and the resonant frequencies of the two working modes at 22.98 and 21.31 Hz. It can track a circular trajectory with the radius of 4.5 mm. The root mean squares (RMS) tracking error is 2 µm. The positioning resolution is 100 nm. The payload capacity test shows that the reified stage can bear 20 kg out-ofplane payload.

Modeling and Stability Analysis of Coarse–Fine Composite Mechatronic System in UAV Multi-Gimbal Electro-Optical Pod

“…In the improved DOB control loop, the control object is set as the coarse-fine composite mechatronic structure, and the minimum phase system under an ideal state is adopted [26][27][28]. The nominal inverse model of the control object is Js B  .…”

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“…Along with the applications in in situ nanoindentation, compliant mechanisms have been extensively exploited for prospective applications, e.g., positioner [19], lithography [20], microscopy [21], and micromanipulator [22]. Specifically, a diamond turning operation was developed using a compliant mechanism [23].…”

Multiresponse Optimization for a Novel Compliant Z-Stage by a Hybridization of Response Surface Method and Whale Optimization Algorithm

“…Based on the essential merits of compliant mechanism such as free wear, free backlash, light weight, small friction, high precision, low cost, and compact mechanism [3][4][5], it has been extensively employed to discover and gradually replace traditional mechanism. In addition, accurate positioning platforms are also inherited from quality characteristic benefits of the compliant mechanism, and they are widely utilized for potential applications such as constantforce precision positioning [6], ultra-violet nanoimprint lithography [7], atomic force microscopy [8], and positioning system for cell micromanipulation [9]. In addition, related to positioning stage for nanoindentation tester, Huang et al proposed a novel in situ nanoindentation instrument with the maximal output displacement of about 11.44 μm.…”