Deposition of amorphous carbon thin films by aerosol-assisted CVD method

Fadzilah, A.N.; Dayana, K.; Rusop, M.

doi:10.1063/1.5036888

Cited by 1 publication

(2 citation statements)

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“…A lot of efforts have been endeavored to produce large-scale a-C thin films with controllable thickness and properties. [14][15][16] The synthesis can be largely classified into physical vapor deposition (PVD), [17][18][19][20][21][22][23][24][25][26] chemical vapor deposition (CVD), [16,[27][28][29][30][31][32][33][34] and thermal conversion (TC). [14,15,[35][36][37][38] PVD from the graphite sources through sputtering, [17][18][19][20] evaporation, [21][22][23] and filtered vacuum arc deposition [24][25][26] have been widely used for high-quality thin films and surface coatings.…”

Section: Synthesis and Doping Of The A-c Thin Filmsmentioning

confidence: 99%

“…The CVD process which exposes a hydrocarbon gas as a chemical precursor is advantageous in scalable synthesis and good adhesion to the substrate. Carbonization is assisted by radio frequency, [27][28][29] hot-filament, [30] microwave surface-wave plasma, [31] aerosol as a carrier gas, [32] and pulsed-laser. [16,33] Atomic layer deposition (ALD) [34] systems have been occasionally employed for thickness control at the atomic level.…”

Section: Synthesis and Doping Of The A-c Thin Filmsmentioning

confidence: 99%

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Amorphous Carbon Films for Electronic Applications

et al. 2022

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While various crystalline carbon allotropes, including graphene, have been actively investigated, amorphous carbon (a‐C) thin films have received relatively little attention. The a‐C is a disordered form of carbon bonding with a broad range of the CC bond length and bond angle. Although accurate structural analysis and theoretical approaches are still insufficient, reproducible structure–property relationships have been accumulated. As the a‐C thin film is now adapted as a hardmask in the semiconductor industry and new properties are reported continuously, expectations are growing that it can be practically used as active materials beyond as a simple sacrificial layer. In this perspective review article, after a brief introduction to the synthesis and properties of the a‐C thin films, their potential practical applications are proposed, including hardmasks, extreme ultraviolet (EUV) pellicles, diffusion barriers, deformable electrodes and interconnects, sensors, active layers, electrodes for energy, micro‐supercapacitors, batteries, nanogenerators, electromagnetic interference (EMI) shielding, and nanomembranes. The article ends with a discussion on the technological challenges in a‐C thin films.

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