2020
DOI: 10.1002/cptc.202000048
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Deep‐UV Lithography of Nanocomposite Thin Films into Magnetooptical Gratings with Submicron Periodicity

Abstract: Incompatibility of conventional magneto-optical (MO) materials with photonicsystem fabrication processes constitutes a major technological roadblock limiting their integration into photonic devices, especially for micro-or nano-patterned films. This paper proposes a photolithography approach toward MO micro-and nano-patterns, based on hybrid photosensitive matrices doped with magnetic nanoparticles to concentrations as high as 20%vol. The as prepared and characterized nanocomposite thin films exhibit excellent… Show more

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Cited by 2 publications
(4 citation statements)
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“…As shown in a previous study 40 , the concentration of the MNP has an impact on the photopatterning. Patterns with various concentrations of MNP (between 0 and 20 vol%) were prepared using interference lithography (period 600 nm).…”
Section: Resultssupporting
confidence: 56%
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“…As shown in a previous study 40 , the concentration of the MNP has an impact on the photopatterning. Patterns with various concentrations of MNP (between 0 and 20 vol%) were prepared using interference lithography (period 600 nm).…”
Section: Resultssupporting
confidence: 56%
“…The photopatterning setup relies on a Braggstar (Coherent) nanosecond ArF Excimer laser emitting at 193 nm 40 . The beam section measures 3 × 6 mm 2 .…”
Section: Photopatterningmentioning
confidence: 99%
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“…A multiplicity of advanced fabrication techniques have been designed, combined together, and successfully used to tailor magnetic thin films to usage needs. Such techniques are mainly based on top-down approaches such as lithography and etching or on bottom-up approaches involving deposition and self-assembly processes [ 5 , 6 , 7 , 8 , 9 , 10 , 11 , 12 , 13 ].…”
Section: Introductionmentioning
confidence: 99%