ChemInform Abstract (VPE: vapor phase epitaxy; FET: field effect transistor). It is demonstrated that an AsCl3/H2/GaAs solid source VPE system can be used to grow device quality epi-layers. The traps found by optical deep level capacitance transient spectroscopy in the epi-layers are one electron trap, identified as EL2, and three hole traps near the active layer and buffer layer interface. The hole traps are found to be intrinsic defect, Cu, and Fe related defects. The solid GaAs source is identified as the source of impurity contamination. The intrinsic deep trap is influenced by the Ga/As ratio in the gas phase. Low etch flow rates minimize both the impurity transport from solid GaAs and the intrinsic defect density.