2001
DOI: 10.1016/s0022-0248(01)01565-2
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Czochralski growth of six Yb-doped double borate and silicate laser materials

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Cited by 108 publications
(58 citation statements)
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“…We attempted several procedures, such as high temperature annealing during the 10 mm growth and different cooling rates to room temperature. High temperature annealing is necessary to maintain a crystal at the slightly below its melting temperature (Haumesser et al, 2001). In order to avoid cracking into the crystal we suspended crystal growth at every 10 mm step for 1 day.…”
Section: Resultsmentioning
confidence: 99%
“…We attempted several procedures, such as high temperature annealing during the 10 mm growth and different cooling rates to room temperature. High temperature annealing is necessary to maintain a crystal at the slightly below its melting temperature (Haumesser et al, 2001). In order to avoid cracking into the crystal we suspended crystal growth at every 10 mm step for 1 day.…”
Section: Resultsmentioning
confidence: 99%
“…Also, the small quantum defect (5-15%) and high quantum efficiency reduce the thermal load and associated problems [1]. [51][52][53] and its better thermal conductivity [54]. been obtained at 1066 nm.…”
Section: Introductionmentioning
confidence: 98%
“…If doped with different metallic ions, these materials exhibit attractive luminescent properties for potential applications such as: plasma displays [1], laser materials [2] and high-energy phosphors [3]. Y 2 SiO 5 posseses two different crystallographic forms (X1 and X2) while Y 2 Si 2 O 7 shows up to six polymorphic forms (y, α, β, γ, δ, z).…”
Section: Introductionmentioning
confidence: 99%