Crystal Growth Technology 2008
DOI: 10.1002/9783527623440.ch12
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Crystal‐Growth Technology for Ternary III‐V Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation Technique

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Cited by 2 publications
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“…Unfortunately, growth of ternary compounds by conventional melt growth techniques is quite challenging [1][2][3]. Hence, commercial ternary substrates are not readily available.…”
Section: Introductionmentioning
confidence: 99%
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“…Unfortunately, growth of ternary compounds by conventional melt growth techniques is quite challenging [1][2][3]. Hence, commercial ternary substrates are not readily available.…”
Section: Introductionmentioning
confidence: 99%
“…Hence, commercial ternary substrates are not readily available. For ternary crystals with high crystalline quality, precise control of the melt composition and efficient melt mixing during growth is necessary [3]. This poses significant difficulties during the growth of high melting points P-and As-based compounds due to their high vapor pressures of the group V elements.…”
Section: Introductionmentioning
confidence: 99%