Controllable Formation of Zinc Oxide Micro‐ and Nanostructures via DUV Direct Patterning

Yeh, Chun Cheng; Liu, Hung Chuan; Chuang, Ming Yen; Denzer, Joseph; Berling, Dominique; Zan, Hsiao‐Wen; Soppera, Olivier

doi:10.1002/admi.201600373

Cited by 19 publications

(25 citation statements)

References 39 publications

(42 reference statements)

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“…For the MO part, after thermal annealing, structural variation may occur due to the removal of embedded organic compounds. The volume reduction, in some cases, is more than 85%, which dramatically reduces the size of the patterned structures . Some studies observed the appearance of a double‐peak profile on the material topography after annealing, and this change may increase the surface roughness for the subsequently deposited layers .…”

Section: Discussionmentioning

confidence: 99%

“…Compared to other SDP techniques, photopatterning has the advantage of making nanoscale MO patterns for small‐dimension devices by using DUV or EUV lithography and is more efficient and cost‐effective than e‐beam writing. Yeh et al used DUV interference for direct patterning of the photosensitive zinc methacrylate (ZnMAA) precursor into nanoscale periodic lines with a 300 nm line width, as shown in Figure a . After thermal annealing, ZnMAA patterns could be converted into ZnO patterns, as shown in Figure b.…”

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

“…In 2016, Yeh et al used photopatterning to fabricate ZnO nanostructures and investigated their gas sensing properties. The ZnO gas sensor showed good sensitivity, with the ability to detect 1 ppm of acetone and 5 ppm of NO …”

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

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Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

2018

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Due to their transparency and tunable electrical, optical, and magnetic properties, metal oxide thin films and structures have many applications in electro-optical devices. In recent years, solution processing combined with direct-patterning techniques such as micro-/nanomolding, inkjet printing, e-jet printing, e-beam writing, and photopatterning has drawn much attention because of the inexpensive and simple fabrication process that avoids using capital-intensive vacuum deposition systems and chemical etching. Furthermore, practical applications of solution direct-patterning techniques with metal oxide structures are demonstrated in thin-film transistors and biochemical sensors on a wide range of substrates. Since direct-patterning techniques enable low-cost fabrication of nanoscale metal oxide structures, these methods are expected to accelerate the development of nanoscale devices and systems based on metal oxide components in important application fields such as flexible electronics, the Internet of Things (IoT), and human health monitoring. Here, a review of the fabrication procedures, advantages, limitations, and applications of the main direct-patterning methods for making metal oxide structures is presented. The goal is to highlight the examples with the most promising perspective from the recent literature.

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Section: Discussionmentioning

confidence: 99%

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

Section: Electronic Applications Of Solution Direct‐patterned Mo Micrmentioning

confidence: 99%

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Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

2018

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“…In a previous study, zinc methacrylate was used to prepare ZnMAA resist with photosensitivity to DUV light of 193 nm . In the present study, conditions to introduce cobalt (II) acetate into ZnMAA solution with an atomic ratio Co/(Co + Zn) = 0.15 were defined and a stable photosensitive Co‐doped ZnMAA precursor solution could be successfully prepared.…”

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confidence: 95%

Nanoscale Ferromagnetic Cobalt‐Doped ZnO Structures Formed by Deep‐UV Direct‐Patterning

Yeh

Colis

Fioux

et al. 2017

Adv Materials Inter

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COMMUNICATION (1 of 8)structures patterned by holographic dissolution technique. [1] Photopatterned metal oxide structures have shown excellent electrical, optical, and magnetic properties. [2][3][4][5][6] Compared to conventional lithography techniques, photopatterning technologies significantly simplify the process, avoiding in particular the etching step that is delicate on metal oxide and requires toxic chemicals and sophisticated setup. The feature line-width of photo patterned metal oxide structures is related to both photosensitivity of metal oxide precursor and the wavelength of light source. Submicroor nanoscale dimensions can be achieved with the use of high photosensitive metal oxide precursors and short wavelengths light sources such as deep-UV (DUV) (193 nm) and extreme UV (13.5 nm), making photopatterning a promising technology for fabricating micro or even nanoscale devices. [7][8][9][10] Moreover, photopatterning can be applied to obtain multielement metal oxide materials by mixing photosensitive precursor in conditions that control their dispersion at the atomic scale. [11] In recent years, wide bandgap diluted magnetic semiconductors (DMSs) such as transition metal (TM)-doped ZnO and TM-doped TiO 2 are catching intense interest due to their expected potential applications in spin transistors, spin light emitting diodes, spin filters, sensors, and memories. [12][13][14][15][16][17][18] By using photopatterning techniques, TM-doped metal oxide structures can be easily integrated in complex systems. In previous studies, Chen et al. have used photosensitive precursors and UV light to fabricate Co-doped ZnO and Co-doped TiO 2 patterns. [19,20] However, these DMS structures are in microscale dimensions (>100 µm), which cannot be integrated into small-dimension devices. In addition, the effect of photopatterning on the magnetic properties of the TM-doped metal oxides was not investigated. In the present work, we used DUV (193 nm) lithography and photosensitive zinc methacrylate (ZnMAA) precursor doped with cobalt (II) acetate to fabricate Co:ZnO films. At first, the effect of DUV-patterning as well as thermal annealing on the magnetic properties of Co:ZnO films derived from Co-doped ZnMAA precursor was investigated. Then, DUV nano patterning of the photosensitive solutions was demonstrated.In a previous study, zinc methacrylate was used to prepare ZnMAA resist with photosensitivity to DUV light of 193 nm. [21] Cobalt (II) acetate is mixed with zinc methacrylate (ZnMAA) to form a photopatternable Co-doped zinc oxide precursor. By using deep-UV (DUV) interference lithography, Co-doped ZnMAA precursor can be patterned as negative tone resist and transformed into ferromagnetic Co:ZnO films after thermal treatment. Moreover, Co:ZnO patterns as small as 300 nm line-width can be easily obtained. To have an in-depth understanding to the effect of DUVpatterning process as well as thermal annealing on Co:ZnO films derived from Co-doped ZnMAA precursor, optical, magnetic, and electrical characterizations are perf...

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Direct Laser Writing of Crystallized TiO₂ and TiO₂/Carbon Microstructures with Tunable Conductive Properties

Schrodj

Mougin

et al. 2018

Advanced Materials

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for use in conductors, semiconductors, and insulators. [5] Electronic properties are indeed closely linked to the nature of the metal and conditions of fabrication, which determine the structure of the final material at the atomic scale. These properties can be modified by doping with different metals, by adjusting the metal to oxygen stoichiometry or by generating an amorphous or crystal phase. [6][7][8][9] Today, integration of MOs as thin films, micropatterns or nanopatterns by convenient and simple means remains a major challenge for the fabrication of electronic and optoelectronic devices. MOs are commonly deposited as thin films by sputtering. Though the sputtered MOs usually exhibit better electrical properties due to the accurate control of the composition and defect concentration at the atomic scale, solution-based processes have gained much attention during the last years due to their simplicity, cost effectiveness, vacuum-free processes, and high versatility.In solution-based processes, thermal annealing is required to eliminate the solvent and organic ligands that are complexed on metal ions and to obtain material and phase compositions with suitable properties. This step is typically conducted at temperatures ranging from 300 to 1000 °C. Thus, such a fabrication strategy can be difficult to apply in the case of multistep integration processes involving different materials.In this context, laser processing of MOs presents many advantages due to the control of the laser-matter interaction in space and time. [9] Laser curing allows a fast treatment that can be confined to a limited volume by focusing the laser beam. Such a laserinduced effect leads to a much lower energy consumption with respect to that of thermal annealing. For example, a pulsed laser in the ultraviolet (UV) or near-infrared (NIR) range has been successfully used for the crystal growth of amorphous MO films [10,11] or the hydrothermal growth of MO nanostructures. [12,13] Recently, laser processing has also been introduced for the direct writing of MO microstructures. For this purpose, UV or deep-UV (DUV) wavelengths are usually used. At the molecular scale, the patterning proceeds according to the photodecomposition of the metal precursors complexed by organic molecules. Patterning can be obtained at room temperature down to the nanoscale using direct laser writing (DLW), but usually, a thermal post-treatment is needed to obtain an MO with suitable Metal oxides are an important class of materials for optoelectronic applications. In this context, developing simple and versatile processes for integrating these materials at the microscale and nanoscale has become increasingly important. One of the major remaining challenges is to control the microstructuration and electro-optical properties in a single step. It is shown here that near-infrared femtosecond laser irradiation can be successfully used to prepare amorphous or crystallized TiO 2 microstructures in a single step using a direct laser writing (DLW) approach from a TiO 2 precursor ...

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Controllable Formation of Zinc Oxide Micro‐ and Nanostructures via DUV Direct Patterning

Cited by 19 publications

References 39 publications

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

Nanoscale Ferromagnetic Cobalt‐Doped ZnO Structures Formed by Deep‐UV Direct‐Patterning

Direct Laser Writing of Crystallized TiO₂ and TiO₂/Carbon Microstructures with Tunable Conductive Properties

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Controllable Formation of Zinc Oxide Micro‐ and Nanostructures via DUV Direct Patterning

Cited by 19 publications

References 39 publications

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

Nanoscale Ferromagnetic Cobalt‐Doped ZnO Structures Formed by Deep‐UV Direct‐Patterning

Direct Laser Writing of Crystallized TiO2 and TiO2/Carbon Microstructures with Tunable Conductive Properties

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Direct Laser Writing of Crystallized TiO₂ and TiO₂/Carbon Microstructures with Tunable Conductive Properties