Conducting polyaniline is found to be suitable for several lithographic applications. With the use of onium salts, polyaniline is made radiation sensitive and shown to be a high resolution conducting photo and electron‐beam resist. Conducting lines of 0.25 μm have been patterned with e‐beam irradiation. Thin films of conducting polyaniline are found to be effective discharge layers for e‐beam lithography. Insulating resist systems charge during e‐beam exposure, which results in pattern displacements.…
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