Abstract:In this work, we conducted a comparative study of the optical and structural properties of Silicon Rich Oxide (SRO) films deposited by two chemical vapor deposition techniques: at Low Pressure (LPCVD) and activated by Hot Filament (HFCVD). SRO-LPCVD films were deposited at a silane and nitrous oxide pressures (R_0=P_(N_2 O)/P_(〖SiH〗_4 )) rate of R0=10 y R0=25. SRO-HFCVD films were deposited at a hydrogen pressure of 25 and 100 sccm, at a distance between source and substrate of 8 mm. To improve the optical … Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.