Colloidal photolithography applied to functional microstructure on cylinder based on photopatternable TiO 2 sol-gel

Micro–Nanostructured TiN Thin Film: Synthesis from a Photo-Patternable TiO2 Sol–Gel Coating and Rapid Thermal Nitridation

“…Figure 11A shows the nanostructured TiO 2 thin film after UV (λ = 365 nm) illumination and development of the xerogel layer, revealing periodically organized nanopillars that are cylindrical in shape. 24,25 These nanopillars appear to be fairly regular with dimensions of around 300 × 500 nm, in agreement with AFM measurements (Figure 11B). The AFM profile also identified a periodicity of about 1 μm induced by the 1 μm diameter silica microspheres that are in contact with one another during LB deposition.…”

Resonant waveguide grating fabrication on planar and cylindrical substrates using a photosensitive TiO2 sol-gel approach

“…In order to have an idea of the thickness of the waveguide layer, the same process was performed on a flat silica substrate. Studies on sacrificial tubes that were broken to be able to measure the layer height indicate a similar thickness between the waveguide inside the cylinder and the one on the flat substrate produced under the same conditions [26]. For this sample, the thickness of the waveguide layer was estimated to be around 155 nm.…”

“…Measurements of spectral resonances on the cylinder required a specific setup. This setup was previously described [26]. The characterizations (AFM and SEM) of the cylindrical resonant grating have been performed after a sacrificial operation by breaking the microstructured tube.…”

“…The approach introduces the single-step photopatternable sol-gel layer method compatible to complex lithography set-up where both etching and NIL process can not be performed. Sol-gel layers can be deposited on large size and non-conventional substrates like cylinders [26], tubes [25] or plastics [27] using a dip-coating process. Moreover, this photosensitive sol-gel is also compatible with different lithography processes, as for example phase mask lithography [28] or colloidal lithography [29].…”

Compensation of disorder for extraordinary optical transmission effect in nanopore arrays fabricated by nanosphere photolithography

“…The main advantage of colloidal self-assembly over conventional periodic structuration is its high throughput, compatibility with industrial production lines [19] and flexibility in the nanostructuration of curved and non-conventional surfaces [27][28][29]. For example, a plasmonic sensor was prepared on an optical fiber cleaved face using nanosphere photolithography [30].…”