Cold remote nitrogen plasma polymerization from 1.1.3.3‐tetramethyldisiloxane–oxygen mixture

Abstract

SYNOPSISCold remote nitrogen plasma (CRNP) selectively reacts with silane-terminated organosiloxane compounds such as 1.1.3.3-tetramethyldsiloxane to give polymeric layers. Deposition rate measurements, FT-IR and Raman spectroscopy were performed. The chemical composition of the deposited film is closely dependent on the reactive gas composition and its flowing conditions. An original effect of dioxygen addition in the nonionic reactive media is pointed out: dioxygen addition leads to a fast and highly hydrocarbonated polymer formation with a nitrogen fixation in a silazane structure. Polymerization is described by a model where E S i -0 . type of radicals are the critical reactant. A global mechanism is proposed involving active species of the CRNP in initiation step of hydrogen abstraction and the nitrogen triplet state molecule N2(A 3 C ) in methyl abstraction on S S i . type of free radical. Dioxygen adjunction appears to limit the methyl abstraction steps. The efficient direct oxygen reaction on free radicals leads to an increase of the =Si -0' radical density and, consequently of the average length of the growing polymeric fragments. Nitrogen fixation, involving oxygenated species, is discussed. Under defined conditions, a highly hydrophobic polymeric film is obtained with a volumic mass of 1.34 g/cm3 and a deposition rate of about 12 mg/cm2 h corresponding to a growth rate of 200 A/s. 0 1994 John Wiley & Sons, Inc.

Organosilicon Polymers Deposition by PECVD and RPECVD on Micropatterned Substrates

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Barrier behavior hindering Zn++ diffusion from cold remote nitrogen plasma-deposited silicon films

“…The correlation the fact that the films are more crosslinked. 7,15 coefficients are close to 1. The hypothesis made Callebert et al 7 proved that silica-like structure for diffusion coefficients calculation is then good.…”

“…Figure 3 also shows that extraction profiles for coated disks are different from those obtained distilled water at ambient temperature is divided on the deposited films. 7 This low superficial enby nine in comparison with the uncoated ones. ergy is explained by a preferential orientation of…”

“…is removed from the plasma as the plasma and Specific industrial aspects of this plasma have the reaction chamber are spatially separated. [6][7][8] been protected by international patents. 11,12 The Plasma-deposited organosiloxanes films have main reactive species of CRNP are nitrogen many attractive properties; numerous studies atoms, free radicals, and electronically and vibrahave been devoted to the permeability of plasma tionally excited nitrogen molecules.…”

Investigation of the Effect of Plasma Polymerized Siloxane Coating for Enzyme Immobilization and Microfluidic Device Conception

“…The ppTMDSO films were prepared by "cold" RPECVD in the afterglow of nitrogen microwave plasma (N 2 (Alphagaz, Villeneuve d'Ascq, France, purity grade of 99,999%) flow rate of 1.8 standard liter-per-minute), which typical operation conditions previously described [36]. A flow of vapor precursor (TMDSO monomer) was pumped from the liquid reservoir and set by a mass flow controller to obtain 15 sccm, admixed with 25 standard cubic centimeter-per-minute (sccm) O 2 (Praxair-France, purity grade of 99.999%) gas and injected in the plasma afterglow by a tubular injector placed at 27 cm from a glass substrate.…”