“…For example, a freestanding Ti 3 C 2 T x film obtained from Ti 3 AlC 2 powders prepared in an alumina tube furnace is incorporated with small amounts of non-reacted TiC, oxidized components (TiO 2 and Al 2 O 3 ), and components from other side reactions. The fabrication of the freestanding Ti 3 C 2 T x film, which is a multi-step process that includes wet etching, cycles of washing, de-aerating, sonication, centrifugation, and filtering [24,25], might reduce the amount of impurities from the Ti 3 AlC 2 powders preparation but at the same time introduce new impurities in one or several of the Ti 3 C 2 T x processing steps, such as metal halides, alcohols, and graphite-like materials (Figs. 1 and 2).…”