Characterization of focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser

Vyšín, L.; Burian, T.; Chalupský, J.; Grisham, M.; Hájková, V.; Heinbuch, S.; Jakubczak, Krzysztof; Martz, Dale; Mocek, Tomáš; Pira, Peter; Polan, J.; Rocca, J. J.; Rus, B.; Sobota, Jaroslav; Juha, L.

doi:10.1117/12.822759

Cited by 11 publications

(6 citation statements)

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“…The first experimental system utilized in this experimental campaign ( Figure 3) is a capillary-discharge Ne-like Ar EUV laser [6]. This laser has been developed and built at CSU in Fort Collins.…”

Section: Methodsmentioning

confidence: 99%

EUV ablation: a study of the process

et al. 2015

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An investigation on short-wavelength ablation mechanism of poly(1,4-phenylene ether ether-sulfune) PPEES and poly (1-hexadecene-sulfone) PHDS (Figure 9-10) by EUV radiation is presented. The goal of this work is to evaluate the ablation behavior with respect to the influence of wavelength, fluence and quantum efficiency. Because there is no yet a general EUV ablation theory, data are analyzed in order to underline regularity of the process which can be used in future to detect the scaling laws of the process. The differences with longer wavelengths ablation and EUV one are pointed out and possible applications of EUV ablation are proposed.

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Section: Methodsmentioning

confidence: 99%

EUV ablation: a study of the process

et al. 2015

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“…XUV pulses provided by the CDL device exhibited a duration and energy of 1.5 ns (full width at half maximum (FWHM)) and up to 10 mJ, respectively. The CDL beam was focused using a 50-cm focal length Sc/Si multilayer mirror with a refl ectivity of 30% [13]. The CDL repetition rate was 2 Hz and 3 Hz for the ablation investigation and the PLD test, respectively.…”

Section: Methodsmentioning

confidence: 99%

“…This value was considered during an estimation of the XUV laser fl uence. From the mathematical model of the beam caustics [13] and the known energy delivered within the pulse, the maximum power density on the sample surface was found to be as high as approximately 250 MW/cm 2 .…”

Section: Methodsmentioning

confidence: 99%

Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

et al. 2020

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Extreme ultraviolet (XUV) capillary-discharge lasers (CDLs) are a suitable source for the efficient, clean ablation of ionic crystals, which are obviously difficult to ablate with conventional, long-wavelength lasers. In the present study, a single crystal of cesium iodide (CsI) was irradiated by multiple, focused 1.5-ns pulses of 46.9-nm radiation delivered from a compact XUV-CDL device operated at either 2-Hz or 3-Hz repetition rates. The ablation rates were determined from the depth of the craters produced by the accumulation of laser pulses. Langmuir probes were used to diagnose the plasma plume produced by the focused XUV-CDL beam. Both the electron density and electron temperature were sufficiently high to confirm that ablation was the key process in the observed CsI removal. Moreover, a CsI thin film on MgO substrate was prepared by XUV pulsed laser deposition; a fraction of the film was detected by X-ray photoelectron spectroscopy.

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“…The samples were irradiated with the beam of a Ne-like Ar capillary discharge laser operating at 46.86 nm wavelength on a 3p→3s transition (J=0 to 1) in Ne-like argon. Full details of this table-top soft X-ray laser have been given in the previous publications 12, 16 . The discharge driven by a 22 kA peak current occurs through a 380 mTorr argon gas in a 21 cm long and 3.2 mm diameter capillary tube.…”

Section: Xuv Sourcementioning

confidence: 99%

Damage to dry plasmid DNA induced by nanosecond XUV-laser pulses

et al. 2011

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Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugar and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. The complexity of lesions produced in DNA by ionizing radiations is thought to depend on the amount of energy deposited at the site of each lesion. We have studied the nature of DNA damage induced directly by the pulsed 46.9 nm radiation provided by a capillary-discharge Ne-like Ar laser (CDL). Different surface doses were delivered with a repetition rate of a few Hz and an average pulse energy ~ 1 µJ. A simple model DNA molecule, i.e., dried closed-circular plasmid DNA (pBR322), was irradiated. The agarose gel electrophoresis method was used for determination of both SSB and DSB yields. Results are compared with a previous study of plasmid DNA irradiated with a single sub-nanosecond 1-keV X-ray pulse produced by a large-scale, double-stream gas puff target, illuminated by sub-kJ, near-infrared (NIR) focused laser pulses at the PALS facility (Prague Asterix Laser System).

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Characterization of focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser

Cited by 11 publications

References 0 publications

EUV ablation: a study of the process

EUV ablation: a study of the process

Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

Damage to dry plasmid DNA induced by nanosecond XUV-laser pulses

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