DOI: 10.1109/plasma.2004.1339998
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J.A. Hopwood, D. Mao

Abstract: Vapor deposition using ionic species has several advantages over neutral vapor deposition methods. These include the ability to use the electric field within the plasma sheath to modify the energy and direction of the depositing particle. Energetic deposition allows one to produce thin film materials with tailored properties. The control of particle direction, on the other hand, allows for the deposition of materials into high aspect ratio microstructures, such as those encountered in modem integrated circuit…

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