2014
DOI: 10.1002/pssa.201300632
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CdTe deposition by successive ionic layer adsorption and reaction (SILAR) technique onto ZnO nanowires

Abstract: In this study is reported CdTe deposition by Successive Ionic Layer Adsorption and reaction (SILAR) at room temperature onto ZnO nanowires (NWs). The as‐deposited CdTe layer exhibits poor crystalline quality and not well defined optical transition which is probably result of its amorphous nature. The implementation of an annealing step and chemical treatment by CdCl2 to the classical SILAR technique improved significantly the CdTe film quality. The XRD analysis showed that the as treated layers are crystallize… Show more

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Cited by 10 publications
(4 citation statements)
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“…All attempts to deposit CdTe onto PbTe or onto PbTe/CdTe cores by using SILAR (with TOPTe as the Te source) were unsuccessful, yielding irregularly shaped nanocrystals with degraded PL properties. We attribute this negative result to the high propensity of surface amorphization of PbTe and CdTe; similar results have also been reported, for instance, for SILAR‐grown CdTe films and in PbTe/PbS QDs . We also emphasize that the SILAR method appears to be best suited for more ionic sulfides, such as CdS.…”
Section: Figurementioning
confidence: 99%
“…All attempts to deposit CdTe onto PbTe or onto PbTe/CdTe cores by using SILAR (with TOPTe as the Te source) were unsuccessful, yielding irregularly shaped nanocrystals with degraded PL properties. We attribute this negative result to the high propensity of surface amorphization of PbTe and CdTe; similar results have also been reported, for instance, for SILAR‐grown CdTe films and in PbTe/PbS QDs . We also emphasize that the SILAR method appears to be best suited for more ionic sulfides, such as CdS.…”
Section: Figurementioning
confidence: 99%
“…M a n u s c r i p t 3 This technique has been described in detail in [23][24][25]. The advantages of this method, which is one version of the "layer by layer" (LbL) deposition technique and in many articles has the name successive ionic layer adsorption and reaction (SILAR) [26][27][28][29], include precise control of the thickness of the growing layer and the size of the surface clusters formed. The primary objective of this work was to evaluate the possibilities of this method for the formation of gold nanoparticles of a required size and to determine the optimal synthesis conditions for their use in the manufacturing of SnO 2 conductometric gas sensors.…”
Section: Introductionmentioning
confidence: 98%
“…Only a couple of papers are devoted to the formation of gold nanoparticles on Al 2 O 3 and TiO 2 substrates for plasmon excitation studies using this method [28]. Currently, the SILAR method is being used usually for the synthesis of metal chalcogenide semiconductor quantum dots [27,29].…”
Section: Introductionmentioning
confidence: 99%
“…In chemical deposition methods there is wastage of material in the form of precipitation which can be avoided in SILAR method. Besides material saving, it has numerous advantages such as simple, cost-effective, and scalable and allows low temperature deposition on any complex shape substrate. , Previously many groups have applied the SILAR method to deposit ZnO thin films and also studied their structural, optical, and temperature dependent properties. ,, In recent days substantial work has been done on its nanocomposite thin films, , photoluminescence (PL), , and doping ,,, However, instead of NH 4 OH, use of NaOH is not well explored .…”
Section: Introductionmentioning
confidence: 99%