2007
DOI: 10.1063/1.2730578
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Carbon nanotube cantilevers on self-aligned copper silicide nanobeams

Abstract: In this letter, the authors describe both a growth method for self-aligning copper silicide (Cu3Si) nanobeams and their use as active catalysts for carbon nanotube (CNT) synthesis via chemical vapor deposition. In the unique geometry of these useful structures, CNT cantilevers are anchored firmly to the Cu3Si nanobeams. The resulting CNT-Cu3Si structures may improve accuracy and reliability of CNT applications in nanoelectromechanical systems.

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Cited by 24 publications
(22 citation statements)
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“…Similarly, previous reports using Cu as a seed for elemental Si NW formation have always led the formation of orthorhombic Cu 3 Si catalyst seeds from the initial Cu nanoparticles. [36][37][38] It thus seems likely that pure Si NWs would have been formed in this system had Cu 3 Si crystallites been formed on the Cu substrate rather than Cu 15 Si 4 crystallites. Therefore, the phase of silicide (or germanide) formed on the substrate plays an important role in determining whether pure Si (or Ge) NWs or silicide (germanide) NWs form.…”
Section: Resultsmentioning
confidence: 99%
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“…Similarly, previous reports using Cu as a seed for elemental Si NW formation have always led the formation of orthorhombic Cu 3 Si catalyst seeds from the initial Cu nanoparticles. [36][37][38] It thus seems likely that pure Si NWs would have been formed in this system had Cu 3 Si crystallites been formed on the Cu substrate rather than Cu 15 Si 4 crystallites. Therefore, the phase of silicide (or germanide) formed on the substrate plays an important role in determining whether pure Si (or Ge) NWs or silicide (germanide) NWs form.…”
Section: Resultsmentioning
confidence: 99%
“…Two terminal transport measurements acquired between the contacts showed perfect ohmicity and differential conductance (dI/dV) analysis (inset) shows no asymmetry in the curves confirming a purely ohmic transport through the NW. From I-V analysis, the unit resistance was determined to be 266 Ω µm -1 with a corresponding resistivity ρ = ~208 µΩ cm for a Cu 15 Si 4 NW with a ~100 nm diameter, circular cross-section. Additional information on the electrical analysis and an SEM image of the device are presented in the Supporting Information ( Figure S9 for the latter).…”
Section: Resultsmentioning
confidence: 99%
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