1995
DOI: 10.1016/1010-6030(95)04080-y
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Cadmium sulfide with iridium sulfide and platinum sulfide deposits as a photocatalyst for the decomposition of aqueous sulfide

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Cited by 32 publications
(16 citation statements)
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“…Through photoelectrochemical characterization, it was demonstrated that CdS is less prone to photocorrosion when loaded with either Rh and Ru. 226 In situ photodeposition of metals on CdS in solutions containing sulfide has been studied in detail, 25 revealing that the optimal order of metals to use in photocatalytic H 2 evolution is Rh > Pt > Pd > Ru ≈ Ir > Co ≈ Ni ≈ Fe. Also for Pt, in situ photodeposition resulted in higher photocatalytic activities than use of ex situ obtained Pt/CdS (Figure 16).…”
Section: Comparison Of Cocatalysts Inducing Hydrogen Evolution Activitymentioning
confidence: 99%
“…Through photoelectrochemical characterization, it was demonstrated that CdS is less prone to photocorrosion when loaded with either Rh and Ru. 226 In situ photodeposition of metals on CdS in solutions containing sulfide has been studied in detail, 25 revealing that the optimal order of metals to use in photocatalytic H 2 evolution is Rh > Pt > Pd > Ru ≈ Ir > Co ≈ Ni ≈ Fe. Also for Pt, in situ photodeposition resulted in higher photocatalytic activities than use of ex situ obtained Pt/CdS (Figure 16).…”
Section: Comparison Of Cocatalysts Inducing Hydrogen Evolution Activitymentioning
confidence: 99%
“…The reaction mechanisms for the photocatalytic decomposition of H 2 S in the presence of photocatalyst are proposed [22].…”
Section: Photocatalytic Studies Of Znbigaomentioning
confidence: 99%
“…Platinum and palladium chalcogenides find applications in catalysis [1][2][3][4][5] and materials science. 6,7 The synthesis of thiocarbamato complexes of platinum and palladium from reaction of an aqueous solution of ammonium dithiocarbamate with platinum or palladium salts has been reported by Nakamoto 8 and Kuriacose 9 and we have now used these compounds as precursors for the preparation of metal sulfide nanoparticles and thin films.…”
Section: Introductionmentioning
confidence: 99%