2014
DOI: 10.1007/s40553-014-0007-8
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Abstract: Boron (B) is one of the most problematic impurities to remove from metallurgical grade silicon in the production of more pure solar grade silicon (SoG-Si). In the present work, recent progresses in the application of reactive gases for B removal from molten silicon is reviewed. Moreover, in order to clarify the mechanisms and kinetics of gas-based B-refining, an experimental procedure using humidified Ar, N 2 , and H 2 gases applied to boron-doped silicon melt is described. It is shown that the kinetics and ex… Show more

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Cited by 8 publications
(19 citation statements)
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References 14 publications
(28 reference statements)
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“…Moreover, the rate of B removal is higher using the binary H 2 -H 2 O gas mixtures than other types of gas mixtures, such as humidified argon and nitrogen [12] , as well as the Ar-H 2 -H 2 O gas mixtures [4] . Moreover, the rate of B removal is increased with increasing H 2 O content of the gas mixture [16] , as long as a stable passive oxide layer over the melt surface does not formed through silicon oxidation to SiO 2 [12] .…”
Section: Introductionmentioning
confidence: 99%
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“…Moreover, the rate of B removal is higher using the binary H 2 -H 2 O gas mixtures than other types of gas mixtures, such as humidified argon and nitrogen [12] , as well as the Ar-H 2 -H 2 O gas mixtures [4] . Moreover, the rate of B removal is increased with increasing H 2 O content of the gas mixture [16] , as long as a stable passive oxide layer over the melt surface does not formed through silicon oxidation to SiO 2 [12] .…”
Section: Introductionmentioning
confidence: 99%
“…The removal of boron by different reactive gases, such as O 2 [2,3] , H 2 [4,5] , CO 2 [3] , and H 2 O [6,7,8,9,10,11,12] , has been studied through several research groups. It has been observed that the application of the H 2 -O 2 gas mixtures in plasma refining is more effective in terms of the kinetics of B removal compared to the single H 2 , O 2 , CO 2 gases [13,14] .…”
Section: Introductionmentioning
confidence: 99%
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