Binary and ternary NiTi-based shape memory films deposited by simultaneous sputter deposition from elemental targets

Sanjabi, S.; Cao, Y.; Sadrnezhaad, S. K.; Barber, Z. H.

doi:10.1116/1.2011404

Cited by 30 publications

(18 citation statements)

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“…8 However, it has been well established that sputter deposition is the most practical technique for depositing NiTi with sufficient shape memory effect. 6,[9][10][11][12][13][14][15] Sputtering is the best option for depositing NiTi thin films because the conventional vacuum evaporation of NiTi leads to the potential problem of difference in evaporation rate due to difference in vapor pressure, thus making composition control more difficult. 1 One of the techniques used for sputtering NiTi onto silicon (Si) wafers is simultaneous cosputtering from a Ni50Ti50 alloy and pure Ti targets.…”

Section: Figmentioning

confidence: 99%

“…%) near the equiatomic composition can shift the phase change by as much as 100 °C. 6 Therefore, the NiTi composition is generally targeted at Ni50Ti50.…”

Section: Figmentioning

confidence: 99%

“…Therefore, a second pure Ti target is commonly added to enable precise composition control of the resulting thin film. 6,16 Previously, we developed a co-sputtered NiTi thin-film material deposition process and characterized the material. 17 We also developed a fabrication process to enable free-standing NiTi/platinum (Pt) cantilever thermal actuators and demonstrated their basic operation.…”

Section: Figmentioning

confidence: 99%

“…1,5 The basic phenomenon of the shape memory effect is the phase transition between a low temperature, low symmetry martensite phase and the relatively high temperature, high symmetry austenite phase, which is a reversible process. 6 During heating, a significant increase in stress is present due to the change from martensite to austenite.…”

Section: Introductionmentioning

confidence: 99%

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Characterization of Sputtered Nickel-Titanium (NiTi) Stress and Thermally Actuated Cantilever Bimorphs Based on NiTi Shape Memory Alloy (SMA)

Srour¹,

Knick²,

Morris³

2015

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Sensors and Electron Devices Directorate, ARLApproved for public release; distribution is unlimited.ii Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing the burden, to Department of Defense, Washington Headquarters Services, Directorate for Information Operations and Reports (0704-0188), 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302. Respondents should be aware that notwithstanding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. REPORT DOCUMENTATION PAGE PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS.

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Section: Figmentioning

confidence: 99%

“…%) near the equiatomic composition can shift the phase change by as much as 100 °C. 6 Therefore, the NiTi composition is generally targeted at Ni50Ti50.…”

Section: Figmentioning

confidence: 99%

Section: Figmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Characterization of Sputtered Nickel-Titanium (NiTi) Stress and Thermally Actuated Cantilever Bimorphs Based on NiTi Shape Memory Alloy (SMA)

Srour¹,

Knick²,

Morris³

2015

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“…In order to use shape memory-based micro-actuators at elevated temperatures, thin films with higher transformation temperatures need to be developed. Ti-Ni-Hf and Ti-Ni-Zr alloys are promising candidates for this purpose, as they demonstrate both high transformation temperatures (>100°C) and low cost compared to the Ti-Ni-Pd and Ti-Ni-Pt systems [8][9][10][11].…”

Section: Introductionmentioning

confidence: 99%

A High-Temperature Combinatorial Technique for the Thermal Analysis of Materials

Vlassak¹

2008

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Standard Form 298 (Rev. 8/98) REPORT DOCUMENTATION PAGEPrescribed by ANSI Std. Z39.18 Form Approved OMB No. 0704-0188The public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing the burden, to the Department of Defense, Executive Services and Communications Directorate (0704-0188). Respondents should be aware that notwithstanding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. Calorimetry is a powerful characterization tool that is used to study phase transformations and reactions in materials. Nanocalorimetry is a novel variant of this technique in which thin-film and micro-machining technologies are used to fabricate calorimeter sensors that are much more sensitive than traditional calorimeters, that can access a much broader range of heating and cooling rates, and that lend themselves well to combinatorial studies. PLEASE DO NOT RETURN YOUR SPONSORING/MONITORING AGENCY NAME(S) AND ADDRESS(ES) 10. SPONSOR/MONITOR'S ACRONYM(S) SPONSOR/MONITOR'S REPORT NUMBER(S)The first half of the report focuses on the new experimental techniques and capabilities that have been developed as part of this project. A detailed description is provided of the experimental setup that was developed to perform combinatorial measurements. A new ac-scanning calorimetry technique is presented, which is virtually insensitive to heat loss even at elevated temperatures and low scan rates. We also present the first in-situ synchrotron diffraction measurements that can be performed in conjunction with nanocalorimetry for the structural analysis of the samples.The second half of the report presents experimental results obtained for several materials systems, including the Ni-Ti-Zr and Ni-Ti-Hf high-temperature shape memory alloys and the Au-Si-Cu metallic glass system. Some preliminary results on the formation of ZrB 2 coatings through use of reactive multilayers are also presented.

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EIS study of porous NiTi biomedical alloy in simulated body fluid

Attarchi

Mazloumi

Behckam

et al. 2009

Materials & Corrosion

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The electrochemical impedance spectroscopy was used for monitoring the formation of surface film on a fixtured sintering porous NiTi biomedical alloy in simulated body fluid (SBF) media during 12 days. Effect of NiTi sintering time on the formation of surface film in SBF was investigated. The formed surface film was calcium phosphate hydrate (CPH) with a pillar particulate structure which was developed to a spongy network with increasing the sintering time. Using such electrochemical techniques, it was shown that NiTi samples obtained after 3 h sintering at 950 8C, have higher tendency for the formation of a stable CPH film during the test.

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Binary and ternary NiTi-based shape memory films deposited by simultaneous sputter deposition from elemental targets

Abstract: Articles you may be interested inStructural and magnetic properties of magnetron sputtered Ni-Mn-Sn ferromagnetic shape memory alloy thin films

Cited by 30 publications

References 23 publications

Characterization of Sputtered Nickel-Titanium (NiTi) Stress and Thermally Actuated Cantilever Bimorphs Based on NiTi Shape Memory Alloy (SMA)

Characterization of Sputtered Nickel-Titanium (NiTi) Stress and Thermally Actuated Cantilever Bimorphs Based on NiTi Shape Memory Alloy (SMA)

A High-Temperature Combinatorial Technique for the Thermal Analysis of Materials

EIS study of porous NiTi biomedical alloy in simulated body fluid

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