2018
DOI: 10.1016/j.surfcoat.2018.07.054
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Bias effects on wear and corrosion behavior of amorphous hydrogenated carbon films with zirconia interlayer

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Cited by 7 publications
(4 citation statements)
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“…The coating was prepared by Technometals in Dayton, OH. Hydrogenated carbon and diamond-like carbon can be obtained using multiple techniques like chemical vapor deposition (CVD) or physical vapor deposition (PVD) 30 . For this study, the PVD technique was used 31 .…”
Section: Methodsmentioning
confidence: 99%
“…The coating was prepared by Technometals in Dayton, OH. Hydrogenated carbon and diamond-like carbon can be obtained using multiple techniques like chemical vapor deposition (CVD) or physical vapor deposition (PVD) 30 . For this study, the PVD technique was used 31 .…”
Section: Methodsmentioning
confidence: 99%
“…Furthermore, it was reported that the formation of a galvanic couple between the films and the substrate also has an important effect on the corrosion properties of film/substrate system [7,20,53], inducing and accelerating pitting corrosion. For GLC-3, the high electrical conductivity of GLC films provides channels for electron transport, while surface defects provide ion channels for the electrolyte.…”
Section: Corrosion and Damage Mechanism Of Glc Filmsmentioning
confidence: 99%
“…The corrosion medium can destroy the interface between the film and the substrate through the pores and defects in the film, leading to catastrophic failure of the components. One common strategy is to add an interlayer between the film and substrate, which can mitigate the performance difference between the film and the substrate, and extend the diffusion path of corrosive media, leading to improvement of the corrosion and wear resistance of the films [10,[20][21][22]. Although different interlayers can make different positive contributions to the performance of GLC films, the gradient interlayer was reported as the optimal solution since the gradient distribution of the Me/C (Me refers to metallic elements such as Cr [10], Ti [23], Al [24] or W [25]) composition eliminates the abrupt chemical or mechanical changes in the film/substrate interface.…”
Section: Introductionmentioning
confidence: 99%
“…Carcione et al [10] grew Ti-doped diamond film on Ti substrates via hot filament CVD (HFCVD) at 750 °C to investigate osteoblast-like cell growth. In a separate study, Esquivel-Puentes et al [11] achieved adhesion of hydrogenated amorphous carbon (a-C:H) films on titanium alloys (Ti6Al4V) via microwave plasma CVD (MPCVD) by inserting a zirconia-doped with silicon interlayer via R.F. sputtering prior to (a-C:H) film deposition to study bias effects on wear and corrosion behavior.…”
Section: Introductionmentioning
confidence: 99%