“…Room temperature deposition is enabled by highly reactive species generated in the plasma, such as radicals, ions, electrons, and photons. By controlling their flux and energy, film properties can be tailored for specific applications [ 23 , 25 , 26 , 27 , 28 ]. In remote inductively coupled plasma (remote-ICP), the plasma properties, such as ion energy distribution function (IEDF), electron temperature ( T e ), ion and electron density ( n i and n e , respectively) depend mainly on plasma gas pressure and composition, applied plasma power and the chamber configuration.…”