Atomic Layer Deposition of Nanostructured TiO<sub>2</sub> Photocatalysts via Template Approach

Kemell, Marianna; Pore, Viljami; Tupala, Jere; Ritala, Mikko; Leskelä, Markku

doi:10.1021/cm062576e

Cited by 117 publications

(116 citation statements)

References 40 publications

Supporting

Mentioning

109

Contrasting

Order By: Relevance

“…TEM characterization of the TiO2-coating on Ox-NPAM + TiO2 is shown in Figure 2, indicating that the ALD deposits exhibit a nanocrystalline structure, which can be indexed to anatase phase of titanium dioxide [21], similar to that reported in the literature for ALD deposited TiO2 films. Despite the lower deposition temperature employed in our work [8,10] and the fact that our samples were not annealed after deposition [11,12], our results are in good agreement with those obtained for the same precursors and deposition temperature [16]. The thickness of the ALD deposit can be estimated from TEM images by the measurement of TiO2 nanotube wall thickness as shown in Figure 2a [12], and it takes values around 5 nm in good agreement with manufacture condition previously indicated.…”

Section: Chemical and Morphological Characterization Of The Nanoporousupporting

confidence: 89%

“…The ALD technique is based on the vapor phase deposition method considering sequential and self-limiting reactions, which offers exceptional deposition conformality with high aspect ratio (quotient length to diameter) even for nanoporous structures. In particular, TiO 2 deposition into NPAMs by ALD technique has recently attracted broad scientific interest for their applications in biomedicine and photocatalysis [8][9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

et al. 2018

View full text Add to dashboard Cite

Geometrical, chemical, optical and ionic transport changes associated with ALD of TiO 2 -coating on the porous structure of two nanoporous alumina membranes (NPAMs), which were obtained by the two-step aluminum anodization method but with different pore size and porosity, are presented. Chemical and morphological changes were determined by analyzing XPS spectra and SEM images, showing practically total coverage of the NPAMs surface and leading to a reduction in the geometrical parameters of both samples, while SAED and high resolution TEM measurements allowed us to determine the crystalline structure and thickness of the TiO 2 -coating, with the latter confirmed by depth-profile XPS analysis. Spectroscopic ellipsometry measurements were also carried out in order to detect changes in characteristic optical parameters (refractive index, n, and extinction coefficient, k), due to the TiO 2 -coating of NPAMs. Considering the common application of NPAMs in solute/ion diffusion processes, the effect of the TiO 2 -coverage on electrochemical parameters was analyzed by measuring the concentration potential with a typical model electrolyte (KCl solutions), leading to an increase of the electropositive character for both kinds of samples.

show abstract

Section: Chemical and Morphological Characterization Of The Nanoporousupporting

confidence: 89%

Section: Introductionmentioning

confidence: 99%

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

et al. 2018

View full text Add to dashboard Cite

show abstract

“…The catalytic properties of such TiO 2 nanomembranes have been demonstrated by (Kemell et al, 2007). Wang et al (2004) patterned self-assembled monolayer of hexagonally arranged polystyrene and SiO 2 nanospheres.…”

Section: Conformal Growth For 2d and 3d Structuresmentioning

confidence: 99%

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

et al. 2014

View full text Add to dashboard Cite

We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable of angstrom resolution, and coverage of high aspect ratio nano-structures using wide range of materials. ALD has explored great potential in the emerging fields of photonics, plasmonics, nano-biotechnology, and microelectronics. ALD technique uses sequential reactive chemical reactions to saturate a surface with a monolayer by pulsing of a first precursor (metal alkoxides or covalent halides), followed by reaction with second precursor molecules such as water to form the desired compound coatings. The targeted thickness of the desired compound material is controlled by the number of ALD-cycles of precursor molecules that ensures the self-limiting nature of reactions. The conformal growth and filling of TiO 2 and Al 2 O 3 optical materials on nanostructures and their resulting optical properties have been described. The low temperature ALD-growth on various replicated sub-wavelength polymeric gratings is discussed.

show abstract

“…One-dimensional TiO 2 thin films with nanoscale structures, such as nanotubes, nanorods, and nanowires, present a variety of applications, including catalysis [1][2][3], gas sensing [4,5], and energy harvesting [6,7], due to their large surface-to-volume ratio, convenient band gap, and quantum confinement effects. Research into synthesizing TiO 2 materials with nanoscale structures has significantly increased in recent years.…”

Section: Introductionmentioning

confidence: 99%

AAO-assisted synthesis of highly ordered, large-scale TiO2 nanowire arrays via sputtering and atomic layer deposition

Zhao¹,

Li²,

Kim³

2016

Nano Online

View full text Add to dashboard Cite

Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization process. To investigate the high-aspect-ratio (7.5:1) filling process, both sputtering and atomic layer deposition (ALD) were used to form TiO 2 nanowires. Field emission scanning electron microscopy and high-resolution transmission electron microscopy images indicated that mushroom-like TiO 2 structures were sputtered onto the AAO template surface, and the ALD-coated TiO 2 exhibited fine filling results and clear crystal grain boundaries. Large-scale and free-standing TiO 2 nanowire arrays were liberated by selectively removing the aluminum substrate and AAO template via a wet etching process with no collapsing or agglomeration after the drying process. ALD-deposited TiO 2 nanowire arrays that were 67 nm in diameter and 400 nm high were transferred from the AAO template. The ALD process enabled the rapid, simple synthesis of highly ordered TiO 2 nanowire arrays with desired parameters such as diameter, density, and thickness determined using diverse AAO templates.

show abstract

Atomic Layer Deposition of Nanostructured TiO₂ Photocatalysts via Template Approach

Cited by 117 publications

References 40 publications

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

AAO-assisted synthesis of highly ordered, large-scale TiO2 nanowire arrays via sputtering and atomic layer deposition

Contact Info

Product

Resources

About

Atomic Layer Deposition of Nanostructured TiO2 Photocatalysts via Template Approach

Cited by 117 publications

References 40 publications

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

Influence of TiO2-Coating Layer on Nanoporous Alumina Membranes by ALD Technique

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

AAO-assisted synthesis of highly ordered, large-scale TiO2 nanowire arrays via sputtering and atomic layer deposition

Contact Info

Product

Resources

About

Atomic Layer Deposition of Nanostructured TiO₂ Photocatalysts via Template Approach