The X‐ray and deep UV radiation response is described for resist systems consisting of poly(4‐tert‐butoxycarbonyloxystyrene‐co‐sulfur dioxide) PTBSS combined with an arylmethyl sulfone. A 2:1 4‐tert‐butoxycarbonyloxystyrene (TBS): sulfur dioxide (SO2) resist has been found to function as a highly sensitive, 1.4 nm X‐ray, single‐component, chemically amplified resist. The same resist, however, exhibits reduced sensitivity to 0.8 nm X‐rays and deep UV (248 nm) radiation. Improvement in 0.8 nm X‐ray sen…
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