“…Generally, the properties of thin films strongly depend on the precursor material and various methods of deposition such as plasma polymerization [2,16], pulsed laser deposition [17], ion beam deposition [18,19], chemical vapour deposition (CVD) [20,21], radio frequency (rf)/microwave plasma CVD [22], etc. The plasma polymerization method is largely recommended because it enables the fabrication of very thin films and compounds that could not be obtained by any other methods.…”