Anisotropic In-Plane Conductivity and Dichroic Gold Plasmon Resonance in Plasma-Assisted ITO Thin Films e-Beam-Evaporated at Oblique Angles

Parra-Barranco, Julian; García‐García, Francisco J.; Rico, Víctor J.; Borrás, Ana; López‐Santos, Carmen; Frutos, F.; Barranco, Ángel; González‐Elipe, Agustín R.

doi:10.1021/acsami.5b02197

Cited by 18 publications

(17 citation statements)

References 69 publications

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“…The resistivity of the structure (≈1 Ω⋅cm) is in the level required for interfacial buffer layers for bulk heterojunction organic solar cells [ 47 ] or can find application in the growth of anisotropic aligned nanostructures. [ 48 ]…”

Section: Resultsmentioning

confidence: 99%

Anisotropic Resistivity Surfaces Produced in ITO Films by Laser‐Induced Nanoscale Self‐organization

López‐Santos

Puerto

Siegel

et al. 2020

Advanced Optical Materials

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emitting diodes, flat panel displays, etc.) and energy harvesting (photovoltaics, low emissivity coatings, etc.). [1] They are produced by creating electron degeneracy in a wide bandgap oxide either introducing non-stoichiometry (solid solutions) and/ or appropriate dopants, like Sb or F. [2] This is usually achieved in mixtures of different Group III oxides with metal oxides where the metal can be a part of the semiconductor oxide or act as dopant. This leads to different families of TCOs including AZO (aluminum zinc oxide), IZO (indium zinc oxide), ITO (indium tin oxide), GZO (gallium zinc oxide), and so on. Among them ITO (typically ≈90% wt% In 2 O 3 + 10 wt% SnO 2) plays a key role, especially to produce transparent conductive electrodes (TCEs) in flat-panel displays. Regarding the structuring of ITO films, although wet chemical etching is suitable for producing micron-width electrodes, the need for rapid, and mask-less patterning of large areas led to investigation of the use of laser structuring already in the late 90s. [3] A similarly important application of lasers for processing TCOs is their use for sintering spin-coated films formed by nanoparticles, especially on flexible substrates. [4-6] However, the peculiarities of its absorption spectrum and the regular use of transparent substrates impose limitations in Highly anisotropic resistivity surfaces are produced in indium tin oxide (ITO) films by nanoscale self-organization upon irradiation with a fs-laser beam operating at 1030 nm. Anisotropy is caused by the formation of laser-induced periodic surface structures (LIPSS) extended over cm-sized regions. Two types of optimized structures are observed. At high fluence, nearly complete ablation at the valleys of the LIPSS and strong ablation at their ridges lead to an insulating structure in the direction transverse to the LIPSS and conductive in the longitudinal one. A strong diminution of In content in the remaining material is then observed, leading to a longitudinal resistivity ρ L ≈ 1.0 Ω•cm. At a lower fluence, the material at the LIPSS ridges remains essentially unmodified while partial ablation is observed at the valleys. The structures show a longitudinal conductivity two times higher than the transverse one, and a resistivity similar to that of the pristine ITO film (ρ ≈ 5 × 10 −4 Ω•cm). A thorough characterization of these transparent structures is presented and discussed. The compositional changes induced as laser pulses accumulate, condition the LIPSS evolution and thus the result of the structuring process. Strategies to further improve the achieved anisotropic resistivity results are also provided.

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Section: Resultsmentioning

confidence: 99%

Anisotropic Resistivity Surfaces Produced in ITO Films by Laser‐Induced Nanoscale Self‐organization

López‐Santos

Puerto

Siegel

et al. 2020

Advanced Optical Materials

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“…Thin Film Preparation ITO thin films have been deposited in an e-beam evaporator system previously described for the OAD of nanostructured porous oxide thin films. (6)(7)(8) In this system, a large number of substrates can be deposited simultaneously at different zenithal angles (α) of evaporation ( Figure 1). Values of α= 60º, 70º, 80º and 85º have been used for the films deposited in the absence of plasma (Figure 1), while only α=80º was used when assisting their growth with a plasma.…”

Section: Methodsmentioning

confidence: 99%

(Invited) Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films

Parra-Barranco¹,

Sánchez‐Valencia²,

Aparicio³

et al. 2017

ECS Trans.

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Oblique angle deposition (OAD) is a powerful technique for the fabrication of porous nanostructured oxide thin films. OAD films typically present a columnar tilted nanostructure due to geometrical shadowing effects during the thin film growth. In this work, we study the fabrication of transparent and conducting indium tin oxide films (ITO) by OAD assisted by a microwave ECR plasma. The objective of assisting the deposition with a plasma discharge is to modify the growth mechanism of the OAD process introducing additional parameters to control the columnar microstructure, composition, porosity of the films. The results indicate the OAD ITO deposition assisted by the plasma discharge is a very effective process to develop in-plane structural anisotropy in the ITO nanocolumnar films what determines their electrical properties.

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“…[34,38] We have shown in previous works that this bundling association in transparent films deposited by OAD induces an anisotropic growth of metal nanoparticles upon incorporation in the film pores either by vacuum or wet methodologies. [16,17,26,36,43] This template-based approximation makes use of much less noble metals than procedures based on their direct OAD.…”

Section: Controlling the Aspect Ratio Of Anisotropic Noble Metal Nps mentioning

confidence: 99%

Silver and gold nanoparticles in nanometric confined templates: synthesis and alloying within the anisotropic pores of oblique angle deposited films

Parra-Barranco¹,

Sánchez‐Valencia²,

Barranco³

et al. 2017

Nanotechnology

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In this work we have developed an infiltration methodology to incorporate metal nanoparticles (NPs) of controlled size and shape into the open voids available in oblique angle deposited thin films. These NPs exhibited well-defined surface plasmon resonances (SPRs). The nanometric confined space provided by their porous microstructure has been used as a template for the growth of anisotropic NPs with interesting SPR properties. The fabrication methodology has been applied for the preparation of films with embedded Ag and Au NPs with two associated plasmon resonance features that developed a dichroic behaviour when examined with linearly polarized light. A confined alloying process was induced by near IR nanosecond laser irradiation yielding bimetallic NPs with SPR features covering a large zone of the electromagnetic spectrum. The possibilities of the method for the tailored fabrication of a wide range colour palette based on SPR features are highlighted.

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Anisotropic In-Plane Conductivity and Dichroic Gold Plasmon Resonance in Plasma-Assisted ITO Thin Films e-Beam-Evaporated at Oblique Angles

Cited by 18 publications

References 69 publications

Anisotropic Resistivity Surfaces Produced in ITO Films by Laser‐Induced Nanoscale Self‐organization

Anisotropic Resistivity Surfaces Produced in ITO Films by Laser‐Induced Nanoscale Self‐organization

(Invited) Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films

Silver and gold nanoparticles in nanometric confined templates: synthesis and alloying within the anisotropic pores of oblique angle deposited films

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