2004
DOI: 10.1002/marc.200300245
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An Ordered Nanoporous Monolith from an Elastomeric Crosslinked Block Copolymer Precursor

Abstract: Summary: An ordered nanoporous monolith was prepared from a poly(isoprene‐b‐dimethylsiloxane) (PI‐PDMS) hexagonally packed cylinder precursor. The PDMS cylinders were macroscopically aligned, the PI was crosslinked with dicumyl peroxide, and the PDMS was removed using tetrabutylammonium fluoride. The stability of the pores depended on the modulus of the matrix. At high crosslink density the pores were stable, but they collapsed at a low crosslink density. The nanoporous materials could be swollen in toluene.A … Show more

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Cited by 58 publications
(69 citation statements)
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“…The preparation of porous polymeric materials has been reported with pore sizes ranging from some nanometers to some micrometers. The sacrificial components used to generate nanopores in BCP precursors are diversified and include poly(dimethylsiloxane) (PDMS), [8][9][10] poly(propylene glycol) (PPG), 11 polyisoprene (PI) 12 or poly(methyl methacrylate) 50 (PMMA) 13,14 that can be degraded by reaction with HF or tetrabutyl ammonium fluoride, oxygen plasma treatment (or degradation in presence of fuming nitric acid), ozonolysis or UV irradiation followed by acetic acid extraction, respectively. 5-7 40 In this particular case, the copolymer is composed of at least one sacrificial block that should allow for well-defined porosity after a selective etching process.…”
Section: Introductionmentioning
confidence: 99%
“…The preparation of porous polymeric materials has been reported with pore sizes ranging from some nanometers to some micrometers. The sacrificial components used to generate nanopores in BCP precursors are diversified and include poly(dimethylsiloxane) (PDMS), [8][9][10] poly(propylene glycol) (PPG), 11 polyisoprene (PI) 12 or poly(methyl methacrylate) 50 (PMMA) 13,14 that can be degraded by reaction with HF or tetrabutyl ammonium fluoride, oxygen plasma treatment (or degradation in presence of fuming nitric acid), ozonolysis or UV irradiation followed by acetic acid extraction, respectively. 5-7 40 In this particular case, the copolymer is composed of at least one sacrificial block that should allow for well-defined porosity after a selective etching process.…”
Section: Introductionmentioning
confidence: 99%
“…The chemical cross-linking of PS-b-PLA thin films using RuO 4 has been explored with subsequent removal of the PLA to give a cross-linked nanoporous film. 13 Other studies have appeared on the use of dicumyl peroxide to cross-link polyisoprene-b-polydimethylsiloxane (PIb-PDMS) with subsequent removal of the PDMS phase 11,12 and poly(R-methylstyrene)-b-poly(4-hydroxystyrene) (PRMS-b-PHOST) systems using a photoacid generator to promote cross-linking. 20 However, the addition of small molecules has limitations, including the incorporation of undesirable chemical functionality or metals associated with the cross-linking reaction.…”
Section: Introductionmentioning
confidence: 99%
“…The use of polynorbornene backbones allows the system to be crosslinked after alignment, such that mechanically robust films are produced. This is a key point as it prevents the collapse of nanopores due to Laplace pressure …”
mentioning
confidence: 99%