“…However, the low-doping efficiencies typically associated with Al x Ga 1Àx N layers having high aluminum content can limit the fabrication of heavily doped p-type and n-type layers [7,8]. Even though these difficulties exist, several groups have reported promising results for the development of UV photodetectors, including such devices as photoconductors [9,10], Schottky photovoltaic detectors [11][12][13], p-n and p-i-n photodetectors [3,14,15], metal-semiconductor-metal (MSM) photodetectors [2,16], avalanche photodiodes [17] and phototransistors [18]. Among these devices, p-i-n photodetector structures are especially attractive, because they are compact, consume less power, are rugged and reliable, and can easily be integrated with other electronic circuitry.…”