Alcohol‐Assisted CVD of Silver Using Commercially Available Precursors

Abstract

A novel chemical approach was demonstrated for the growth of high-quality, silver films by CVD. This concept relies on the catalytic reactivity of cationic silver, and of silver surfaces with alcohols. This leads to high-purity films using either state-ofthe-art precursors or silver salts that have not been yet considered as CVD precursors. The occurrence of the catalytic oxidative-dehydrogenation of alcohols, considered as the driving force in this process, was shown by in-situ mass spectrometry (MS). Films of fcc-Ag with q ≤ 2 lX cm were grown without any noticeable contamination. Ag(hfac)COD leads to the growth of a (111) highly orientated film on glass at a rate of 1.66 nm min -1 , while polycrystalline films are grown at a rate of 18.5 nm min -1 using AgNO 3 .

Metal-based Inkjet Inks for Printed Electronics

“…The addition of ethanol in the MOCVD of (hfac)Ag(COD) (hexafluoroacetylacetonato)silver(I)(1,5 -cyclooctadiene) is one such example, where Bahlawane et al [187] identified the surface dehydrogenation of ethanol as the mechanism responsible for faster precursor conversion. Under the same conditions, AgNO 3 forms pure silver films at growth rates up to 18.5 nm min -1 with resistivities of <2 μ cm for 400 nm thick films grown at 573 K. The same methodology was also extended to Cu precursors with similarly positive results of near bulk resistivity copper films [188,189].…”

Controlled Nanostructured Silver Coated Surfaces by Atmospheric Pressure Chemical Vapour Deposition

“…Although, many researchers do determine film thickness by cross-sectional SEM data, some do this gravimetrically. [20] If this had been possible with our samples it would most probably have produced a linear trend through the origin for thickness (proportional to mass of Ag) against number of passes. That more Ag is deposited between 2 and 4 passes can be seen visually as at 2 passes the film is hardly visible, while at 4 passes, although transparent it can be clearly seen, although of the same apparent 'thickness' (or island peak height).…”

“…A more recent paper confirmed that pure silver films may be produced using the metal-organic precursor Ag(hfac)COD, at low pressure. [20] In this paper we propose a route to atmospheric pressure deposited silver layers which overcomes many of the previously reported limitations. Flame Assisted Chemical Vapour Deposition (FACVD) is a low cost, relatively simple atmospheric pressure CVD technique that is compatible with small volume, batch, and high volume continuous coating processes.…”

“…The resistivity of this sample at 8.1 lX cm being higher than that of bulk silver (1.59 lX cm). The resisitivity of a film can be effected by both the connectivity of the crystallites forming the film [20] and by the crystallite size. [3] Small crystallite sizes give a larger contact resistivity.…”

Deposition of metallic silver coatings by Aerosol Assisted MOCVD using two new silver β-diketonate adduct metalorganic precursors

“…This limits the number of available silver precursors suitable for AA-CVD systems. AgNO 3 has indeed been reported as precursor for Ag coatings using AA-MOCVD by N. Bahlawane et al and Ponja et al 7,8 But given the nonorganometallic nature of AgNO 3 , the utilization of such precursor may be limited to some type of CVD reactors. In addition, the development of new organometallic Ag precursors is also interesting, for instance for application in ALD, where suitable Ag precursors ).…”