AFM-Induced Amine Deprotection:  Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

Fresco, Zachary M.; Suez, Itai; Backer, Scott A.; Fréchet, Jean M. J.

doi:10.1021/ja047774q

Cited by 42 publications

(41 citation statements)

References 23 publications

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“…[292,293] Einige Jahre vor der Einführung der konstruktiven Nanolithographie durch Sagiv et al war ein ähnliches Verfahren von Schultz et al vorgestellt worden, bei dem eine katalytische Sonde verwendet wurde. [294] Eine Alkylazid-Monoschicht wurde durch eine katalytische Pt-beschichtete AFMSpitze zum Amin reduziert.…”

Section: Methodsunclassified

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

2005

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Nur wenige Nanometer dicke molekulare Monoschichten können die Eigenschaften von Oberflächen vollkommen verändern. Die Herstellung dieser molekularen Monoschichten kann leicht durch die Langmuir‐Blodgett‐Methode oder durch chemische Adsorption (Chemisorption) an Metall‐ und Oxidoberflächen erfolgen. Dieser Aufsatz konzentriert sich auf chemisorbierte selbstorganisierte Monoschichten (SAMs) als Plattformen für die Funktionalisierung von Siliciumoxidoberflächen. Die Organisation von Molekülen und molekularen Aufbauten auf Siliciumoxid wird in der “Bottom‐Up”‐Nanofabrikation einen außerordentlichen Platz einnehmen und könnte Gebiete wie die Nanoelektronik und die Biotechnologie in naher Zukunft revolutionieren. In den letzten Jahren wurden selbstorganisierte Monoschichten auf Siliciumoxid so weit entwickelt und mit verschiedenen lithographischen Methoden kombiniert, dass neue Nanofabrikationsstrategien und biologische Arrays entwickelt werden können. Will man Fortschritte auf dem Weg von der Bildung zweidimensionaler Muster hin zur dreidimensionalen Fabrikation erzielen, ist die Kontrolle von Oberflächeneigenschaften im Nanometerbereich von größter Bedeutung.

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Section: Methodsunclassified

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

2005

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“…[291] Recently, other research groups have applied local probe oxidation of SAMs for functionalization with cationic gold nanoparticles, quaternary ammonium salts, and polymers. [292,293] A few years before Sagiv and co-workers introduced constructive nanolithography, a similar approach was presented by Schultz and co-workers, who made use of a catalytic probe. [294] In this elegant experiment an alkylazide monolayer was reduced to its corresponding amine by a catalytic Pt coated AFM tip.…”

Section: Constructivenanolithographymentioning

confidence: 98%

Engineering Silicon Oxide Surfaces Using Self‐Assembled Monolayers

2005

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Although a molecular monolayer is only a few nanometers thick it can completely change the properties of a surface. Molecular monolayers can be readily prepared using the Langmuir-Blodgett methodology or by chemisorption on metal and oxide surfaces. This Review focuses on the use of chemisorbed self-assembled monolayers (SAMs) as a platform for the functionalization of silicon oxide surfaces. The controlled organization of molecules and molecular assemblies on silicon oxide will have a prominent place in "bottom-up" nanofabrication, which could revolutionize fields such as nanoelectronics and biotechnology in the near future. In recent years, self-assembled monolayers on silicon oxide have reached a high level of sophistication and have been combined with various lithographic patterning methods to develop new nanofabrication protocols and biological arrays. Nanoscale control over surface properties is of paramount importance to advance from 2D patterning to 3D fabrication.

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“…Numerous methods in this group have been reported, such as anodic oxidation, [9][10][11][12] electrochemical modification, [13,14] electrostatic attraction, [15,16] electrohydrodynamic nanofluidic motion, [17,18] and explosive discharge and shock-wave propagation. [19,20] Most AFM lithographic work is carried out in air, and the formation of a water meniscus [21][22][23][24][25] in the tip-substrate gap plays a crucial role in pattern formation.…”

Section: Introductionmentioning

confidence: 99%

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Xie

Chung

Sow

et al. 2007

Adv Funct Materials

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In this work, an aqueous acidic thin‐layer‐based strategy for fabricating nanostructures on silicon by using atomic force microscopy (AFM) nanolithography is presented. The approach involves the formation of microscale droplets via dilute hydrofluoride (DHF) etching, the conversion of the droplets to acidic thin layers by AFM‐probe scanning, and subsequent lithographic operations using a biased probe in the aqueous layers. By varying the concentration of the acidic DHF layers, the thin layers can facilitate the creation of both positive and negative patterns, such as oxide dots and Si pores, through anodic oxidation and dissolution. In particular, the anodic oxidation in the acidic media is associated with the field‐enhanced nonequilibrium dissociation of the weak electrolyte. The Si pore structure formation is related to the field‐assisted dissolution of anodic oxides and the Si substrate. The acidic‐layer‐based technique allows switching between different lithographic modes by changing the acidity of the DHF layers, and is complementary to bulk solution‐based and local meniscus‐based approaches in AFM nanolithography. In principle, this method can also be extended to other materials that have similar reactions with DHF.

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AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

Cited by 42 publications

References 23 publications

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

Engineering Silicon Oxide Surfaces Using Self‐Assembled Monolayers

Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

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