Abstract:The molecular doping (MD) process consists of depositing a molecular precursor on a silicon substrate, covering the precursor with a cap layer and annealing the sample to decompose the precursor and diffuse dopant atoms within Si. In the literature, preliminary results have shown that dopant diffusion inside a substrate correlates with the presence or absence of the cap layer. The purpose of this work is to study how the cap coating changes the doping process and efficiency. The authors investigate and compare… Show more
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