Advanced Carriers on Legacy CMP Tools - an Intelligent Solution for Flexible Production Environments and R&D Labs

Abstract

This paper describes the potential of a membrane carrier upgrade for legacy CMP tools, such as an IPEC 472. Seventeen different polish parameter settings were applied for both, 150 mm and 200 mm wafers in order to cover a wide range of applications. Resulting from these experiments, a significant performance gain in comparison to stiff carriers becomes evident.