“…The resultant material, in this case, is a graded index (GRIN) isotropic nonhomogeneous dielectric 38 . Having such GRIN material opens up a wide range of fabrication methods to realize the device, including drilling sub-wavelength holes in a dielectric substrate 5 , 39 , 40 , using graded photonic crystals 41 – 43 , dielectric layered shell deposition 39 , 44 , 45 , electron-beam lithography 46 – 48 , and 3D printing 49 , 50 . Owing to their practicality, CTO and QCTO have drawn a great deal of attention.…”