Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Kim, Si Hyun; Lee, Si-Hyeung; Yeo, Gi-Sung; Lee, Jeong Hyeong; Cho, Han-Ku; Han, Woo-Sung; Moon, Joo-Tae

doi:10.1117/12.485117

Advances in Resist Technology and Processing XX 2003

DOI: 10.1117/12.485117

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Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Si Hyun Kim¹,

Si-Hyeung Lee²,

Gi-Sung Yeo³

et al.

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Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

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