Aaron D. Lilak, Viswanath Krishnamoorthy, David Vieira, Mark Law, Kevin Jones
Abstract:AbstractThe ion implantation of boron remains the most practical means of forming shallow and ultra-shallow p+/n junctions in silicon. A high conductive junction requires both a large density of dopant atoms and electrical activation amongst these. While it is possible to simply higher doses of boron at lower energies, the potential benefits of the changes are often muted by the electrical deactivation of the boron was occurs through a clustering process. Therefore, it is important to do understanding of the k…
scite is a Brooklyn-based startup that helps researchers better discover and evaluate scientific articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by researchers from dozens of countries and is funded in part by the National Science Foundation and the National Institute of Drug Abuse of the National Institutes of Health.