1996
DOI: 10.1016/s0926-860x(96)00215-3
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A review of the use of plasma techniques in catalyst preparation and catalytic reactions

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Cited by 144 publications
(37 citation statements)
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“…Recently, the glow discharge plasma which consists of highly excited atoms and molecules, ions, electrons, radicals, neutral particles and so on, is widely used to treat the catalyst to modify its properties [27,55,56]. Vissokov et al published distinct papers about plasma synthesis and regeneration of nanocatalysts for various reactions [57][58][59][60][61].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, the glow discharge plasma which consists of highly excited atoms and molecules, ions, electrons, radicals, neutral particles and so on, is widely used to treat the catalyst to modify its properties [27,55,56]. Vissokov et al published distinct papers about plasma synthesis and regeneration of nanocatalysts for various reactions [57][58][59][60][61].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, without a clear understanding of the interactive phenomena, a simple spatial combination of the two may result in a simple summing or even a negative effect on the process. A few fine reviews on plasma catalysis are available that will be helpful for understanding the physics underlying the interaction (Boutonnet Kizling & Jaras, 1996;Chen, Lee, Chen, Chao, & Chang, 2008;Van Durme, Dewulf, Leys, & Van Langenhove, 2008).…”
Section: Plasma-catalyst Fusion Processmentioning
confidence: 99%
“…[1][2][3][4] Various thermal and cold plasmas, including plasma jets, DC coronas, arcs, glow discharges, radio frequencies and microwaves, have been applied to the generation of ultrafine particles, preparation of supported catalysts and/or modification of catalyst surfaces. In contrast, dry processes (including chemical/physical vapour deposition, sputtering and ion implantation), which are typically applied in the rapidly emerging field of semiconductor technology, remain limited as catalyst preparation techniques.…”
Section: Introductionmentioning
confidence: 99%